Inventor
HU JINCHUN
CN26 patents
⚠️ This page may combine multiple inventors who share the name “HU JINCHUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNIV TSINGHUA
17 patentsUS11307018B2Apr 19, 2022
Two-degree-of-freedom heterodyne grating interferometry measurement system
UNIV TSINGHUA2 citations71
US10532832B2Jan 14, 2020
Magnetic levitation reaction sphere
UNIV TSINGHUA2 citations71
US9903704B2Feb 27, 2018
Three-DOF heterodyne grating interferometer displacement measurement system
UNIV TSINGHUA2 citations71
US9879979B2Jan 30, 2018
Heterodyne grating interferometer displacement measurement system
UNIV TSINGHUA4 citations71
US12270645B2Apr 8, 2025
High-resolution phase detection method and system based on plane grating laser interferometer
UNIV TSINGHUA1 citations59
US9869857B2Jan 16, 2018
Optical grating phase modulator for laser interference photoetching system
UNIV TSINGHUA0 citations51
US12393127B2Aug 19, 2025
Exposure light beam phase measurement method in laser interference photolithography, and photolithography system
UNIV TSINGHUA0 citations50
US12038690B2Jul 16, 2024
Laser interference photolithography system
UNIV TSINGHUA0 citations50
US11703361B2Jul 18, 2023
Five-degree-of-freedom heterodyne grating interferometry system
UNIV TSINGHUA0 citations50
US9885556B2Feb 6, 2018
Dual-frequency grating interferometer displacement measurement system
UNIV TSINGHUA1 citations50
US11940349B2Mar 26, 2024
Plane grating calibration system
UNIV TSINGHUA0 citations49
US9791789B2Oct 17, 2017
Magnetically suspended coarse motion and fine motion integrated reticle stage driven by planar motor
UNIV TSINGHUA0 citations49
US11022423B2Jun 1, 2021
Method for calibrating an error of installation of an interferometer in a multi-axis laser displacement measurement system
UNIV TSINGHUA0 citations46
US9182217B2Nov 10, 2015
Method for measuring displacement of large-range moving platform
UNIV TSINGHUA0 citations41
US9904183B2Feb 27, 2018
Coarse motion and fine motion integrated reticle stage driven by planar motor
UNIV TSINGHUA0 citations39
US9310797B2Apr 12, 2016
Single degree of freedom vibration isolating device of linear motor and motion control method thereof
UNIV TSINGHUA0 citations39
US9995569B2Jun 12, 2018
Six-degree-of-freedom displacement measurement method for exposure region on silicon wafer stage
UNIV TSINGHUA0 citations38
ZHU YU
4 patentsUS8599361B2Dec 3, 2013
Nanometer-precision six-degree-of-freedom magnetic suspension micro-motion table and application thereof
ZHU YU1 citations52
US9030648B2May 12, 2015
Dual wafer stage exchanging system for lithographic device
ZHU YU0 citations39
US8860927B2Oct 14, 2014
Dual-stage exchange system for lithographic apparatus
ZHU YU0 citations39
US8836918B2Sep 16, 2014
Dual-stage exchange system for lithographic apparatus
ZHU YU0 citations39
SHANGHAI MICROELECTRONICS EQUI
3 patentsUS9752643B2Sep 5, 2017
Negative stiffness system for gravity compensation of micropositioner
SHANGHAI MICROELECTRONICS EQUI1 citations51
US9310782B2Apr 12, 2016
Method for measuring displacement of planar motor rotor
SHANGHAI MICROELECTRONICS EQUI0 citations40
US9766054B2Sep 19, 2017
Planar motor rotor displacement measuring device and its measuring method
SHANGHAI MICROELECTRONICS EQUI0 citations39