Inventor
HARITA YOSHIYUKI
23 patents
⚠️ This page may combine multiple inventors who share the name “HARITA YOSHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JAPAN SYNTHETIC RUBBER CO LTD
18 patentsUS5405720AApr 11, 1995
Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
JAPAN SYNTHETIC RUBBER CO LTD129 citations98
US5494784AFeb 27, 1996
Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
JAPAN SYNTHETIC RUBBER CO LTD21 citations92
US5238774AAug 24, 1993
Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
JAPAN SYNTHETIC RUBBER CO LTD28 citations92
US5215857AJun 1, 1993
1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
JAPAN SYNTHETIC RUBBER CO LTD37 citations92
US4499171AFeb 12, 1985
Positive type photosensitive resin composition with at least two o-quinone diazides
JAPAN SYNTHETIC RUBBER CO LTD40 citations92
US4349619ASep 14, 1982
Photoresist composition
JAPAN SYNTHETIC RUBBER CO LTD30 citations92
US4169068ASep 25, 1979
Stripping liquor composition for removing photoresists comprising hydrogen peroxide
JAPAN SYNTHETIC RUBBER CO LTD35 citations92
US4275142AJun 23, 1981
Photosensitive compositions and printing plates containing same
JAPAN SYNTHETIC RUBBER CO LTD44 citations91
US4106943AAug 15, 1978
Photosensitive cross-linkable azide containing polymeric composition
JAPAN SYNTHETIC RUBBER CO LTD51 citations91
US4886565ADec 12, 1989
Reactive ion etching apparatus
JAPAN SYNTHETIC RUBBER CO LTD28 citations90
US4963463AOct 16, 1990
Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group
JAPAN SYNTHETIC RUBBER CO LTD39 citations89
US4384037AMay 17, 1983
Positive type photosensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD23 citations81
US4623609ANov 18, 1986
Process for forming patterns using ionizing radiation sensitive resist
JAPAN SYNTHETIC RUBBER CO LTD9 citations73
US4407927AOct 4, 1983
Photoresist composition
JAPAN SYNTHETIC RUBBER CO LTD16 citations73
US3948667AApr 6, 1976
Photosensitive compositions
JAPAN SYNTHETIC RUBBER CO LTD14 citations71
US4330612AMay 18, 1982
Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer
JAPAN SYNTHETIC RUBBER CO LTD11 citations68
US4957588ASep 18, 1990
Method for high temperature reaction process
JAPAN SYNTHETIC RUBBER CO LTD10 citations67
US4294908AOct 13, 1981
Photoresist composition containing modified cyclized diene polymers
JAPAN SYNTHETIC RUBBER CO LTD5 citations62
JSR CORP
4 patentsUS6270939B1Aug 7, 2001
Radiation-sensitive resin composition
JSR CORP21 citations92
US6228554B1May 8, 2001
Radiation-sensitive resin composition
JSR CORP23 citations92
US6020104AFeb 1, 2000
Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
JSR CORP23 citations92
US5925492AJul 20, 1999
Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
JSR CORP21 citations92