Inventor
TSUKADA TSUTOMU
JP21 patents
⚠️ This page may combine multiple inventors who share the name “TSUKADA TSUTOMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ANELVA CORP
14 patentsUS4816638AMar 28, 1989
Vacuum processing apparatus
ANELVA CORP335 citations98
US4399016AAug 16, 1983
Plasma device comprising an intermediate electrode out of contact with a high frequency electrode to induce electrostatic attraction
ANELVA CORP121 citations95
US4950956AAug 21, 1990
Plasma processing apparatus
ANELVA CORP71 citations94
US4482419ANov 13, 1984
Dry etching apparatus comprising etching chambers of different etching rate distributions
ANELVA CORP71 citations93
US6199505B1Mar 13, 2001
Plasma processing apparatus
ANELVA CORP38 citations92
US4430151AFeb 7, 1984
Method of monitoring status of a silicon layer by detecting, emission spectra variable during etching
ANELVA CORP35 citations92
US4352725AOct 5, 1982
Dry etching device comprising an electrode for controlling etch rate
ANELVA CORP33 citations92
US4968374ANov 6, 1990
Plasma etching apparatus with dielectrically isolated electrodes
ANELVA CORP54 citations88
US6016765AJan 25, 2000
Plasma processing apparatus
ANELVA CORP7 citations73
US5961776AOct 5, 1999
Surface processing apparatus
ANELVA CORP15 citations72
US4405989ASep 20, 1983
Spectral monitoring device for both plasma etching and sputtering
ANELVA CORP20 citations72
US4376692AMar 15, 1983
Dry etching device comprising a member for bringing a specimen into electrical contact with a grounded electrode
ANELVA CORP14 citations72
US5087341AFeb 11, 1992
Dry etching apparatus and method
ANELVA CORP18 citations69
US4655800AApr 7, 1987
Waste gas exhaust system for vacuum process apparatus
ANELVA CORP17 citations67
NEC CORP
4 patentsUS6043608AMar 28, 2000
Plasma processing apparatus
NEC CORP73 citations94
US5936352AAug 10, 1999
Plasma processing apparatus for producing plasma at low electron temperatures
NEC CORP20 citations92
US5900699AMay 4, 1999
Plasma generator with a shield interposing the antenna
NEC CORP49 citations92
US5565738AOct 15, 1996
Plasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamber
NEC CORP53 citations90