Inventor
TAKANASHI KAZUNORI
JP19 patents
⚠️ This page may combine multiple inventors who share the name “TAKANASHI KAZUNORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
17 patentsUS8927201B2Jan 6, 2015
Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition
JSR CORP4 citations72
US9116427B2Aug 25, 2015
Composition for forming resist underlayer film and pattern-forming method
JSR CORP2 citations61
US8993223B2Mar 31, 2015
Resist pattern-forming method
JSR CORP2 citations61
US12312487B2May 27, 2025
Method for forming protective film, method for manufacturing patterned substrate, and composition
JSR CORP0 citations55
US10025188B2Jul 17, 2018
Resist pattern-forming method
JSR CORP0 citations51
US12265333B2Apr 1, 2025
Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound
JSR CORP0 citations50
US11667620B2Jun 6, 2023
Composition, film, film-forming method and patterned substrate-producing method
JSR CORP0 citations50
US10090163B2Oct 2, 2018
Inorganic film-forming composition for multilayer resist processes, and pattern-forming method
JSR CORP1 citations50
US9891526B2Feb 13, 2018
Pattern forming method
JSR CORP0 citations50
US11454890B2Sep 27, 2022
Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound
JSR CORP0 citations49
US11215928B2Jan 4, 2022
Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate
JSR CORP0 citations48
US8956807B2Feb 17, 2015
Method for forming resist pattern, and composition for forming resist underlayer film
JSR CORP0 citations47
US12572075B2Mar 10, 2026
Composition, method of forming resist underlayer film, and method of forming resist pattern
JSR CORP0 citations45
US12517433B2Jan 6, 2026
Composition, resist underlayer film, method of forming film, method of producing patterned substrate, and compound
JSR CORP0 citations45
US10520814B2Dec 31, 2019
Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrate
JSR CORP0 citations40
US9434609B2Sep 6, 2016
Method for forming pattern, and polysiloxane composition
JSR CORP0 citations39
US9329478B2May 3, 2016
Polysiloxane composition and pattern-forming method
JSR CORP0 citations39