Inventor
SCHOLL RICHARD A
US17 patents
⚠️ This page may combine multiple inventors who share the name “SCHOLL RICHARD A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED ENERGY IND INC
14 patentsUS6222321B1Apr 24, 2001
Plasma generator pulsed direct current supply in a bridge configuration
ADVANCED ENERGY IND INC123 citations98
US6024844AFeb 15, 2000
Enhanced reactive DC sputtering system
ADVANCED ENERGY IND INC114 citations98
US5917286AJun 29, 1999
Pulsed direct current power supply configurations for generating plasmas
ADVANCED ENERGY IND INC132 citations98
US5718813AFeb 17, 1998
Enhanced reactive DC sputtering system
ADVANCED ENERGY IND INC269 citations98
US6001224ADec 14, 1999
Enhanced reactive DC sputtering system
ADVANCED ENERGY IND INC99 citations97
US6007879ADec 28, 1999
Adjustable energy quantum thin film plasma processing system
ADVANCED ENERGY IND INC67 citations96
US5897753AApr 27, 1999
Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
ADVANCED ENERGY IND INC48 citations95
US6633017B1Oct 14, 2003
System for plasma ignition by fast voltage rise
ADVANCED ENERGY IND INC67 citations92
US6368477B1Apr 9, 2002
Adjustable energy quantum thin film plasma processing system
ADVANCED ENERGY IND INC23 citations92
US6217717B1Apr 17, 2001
Periodically clearing thin film plasma processing system
ADVANCED ENERGY IND INC31 citations92
US6183605B1Feb 6, 2001
AC powered system for continuous deposition of a cathode material
ADVANCED ENERGY IND INC37 citations92
US6818103B1Nov 16, 2004
Method and apparatus for substrate biasing in multiple electrode sputtering systems
ADVANCED ENERGY IND INC62 citations91
US6521099B1Feb 18, 2003
Periodically clearing thin film plasma processing system
ADVANCED ENERGY IND INC36 citations87
US7211179B2May 1, 2007
Dual anode AC supply for continuous deposition of a cathode material
ADVANCED ENERGY IND INC3 citations63