Inventor

VERHAVERBEKE STEVEN

US137 patents

⚠️ This page may combine multiple inventors who share the name “VERHAVERBEKE STEVEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VERHAVERBEKE STEVEN

APPLIED MATERIALS INC

Method and apparatus for processing a wafer

Cleaning method and solution for cleaning a wafer in a single wafer process

Methods and apparatuses for drying wafer

Methods for drying wafer

High pressure and high temperature anneal chamber

High pressure and high temperature anneal chamber

High pressure and high temperature anneal chamber

Method of redistribution layer formation for advanced packaging applications

Method of forming a barrier layer for through via applications

Package structure and fabrication methods

Package structure and fabrication methods

Method of reconstituted substrate formation for advanced packaging applications

Organic solvents having ozone dissolved therein for semiconductor processing utilizing sacrificial materials

Method and apparatus for processing a wafer

Cleaning method and solution for cleaning a wafer in a single wafer process

Method and apparatus for dissolving a gas into a liquid for single wet wafer processing

Assisted rinsing in a single wafer cleaning process

Method and apparatus for wafer cleaning

High pressure and high temperature anneal chamber

Method for creating a high refractive index wave guide

Laser ablation system for package fabrication

Stiction-free drying process with contaminant removal for high-aspect ratio semiconductor device STR

Cleaning method and solution for cleaning a wafer in a single wafer process

Methods and devices utilizing the ammonium termination of silicon dioxide films

Single wafer cleaning method to reduce particle defects on a wafer surface

Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber

Cleaning submicron structures on a semiconductor wafer surface

Method and apparatus for wafer cleaning

Cleaning method and solution for cleaning a wafer in a single wafer process

Semiconductor processing using energized hydrogen gas and in combination with wet cleaning

Post-ion implant cleaning for silicon on insulator substrate preparation

Stripping and removal of organic-containing materials from electronic device substrate surfaces

Rotational thermophoretic drying

Matching circuit for megasonic transducer device

Method for via formation by micro-imprinting

High connectivity device stacking

Method and apparatus for laser drilling blind vias

Substrate structuring methods

CFMT INC

Electroless metal deposition of electronic components in an enclosable vessel

Methods for treating semiconductor wafers

Method for sulfuric acid resist stripping

Methods and systems for determining chemical concentrations and controlling the processing of semiconductor substrates

Wet processing methods for the manufacture of electronic components using sequential chemical processing

Method for reducing particle contamination during the wet processing of semiconductor substrates

Wet processing methods for the manufacture of electronic components using liquids of varying temperature

IMEC VZW

Method for semiconductor processing using mixtures of HF and carboxylic acid

MATTSON TECHNOLOGY IP

Processes for treating electronic components

SATO TATSUYA E

In situ vapor phase surface activation of SiO2

NALAMASU OMKARAM

Patterning of magnetic thin film using energized ions and thermal excitation

VERHAVERBEKE STEVEN

Patterning of magnetic thin film using energized ions