Inventor

SHIM WOO-GWAN

KR32 patents

⚠️ This page may combine multiple inventors who share the name “SHIM WOO-GWAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIM WOO-GWAN

SAMSUNG ELECTRONICS CO LTD

Wet process for semiconductor device fabrication using anode water containing oxidative substances and cathode water containing reductive substances, and anode water and cathode water used in the wet process

Methods of manufacturing semiconductor memory devices with unit cells having charge trapping layers

Methods of forming a semiconductor device including a metal silicide layer between a conductive plug and a bottom electrode of a capacitor

Method of and apparatus for removing contaminants from surface of a substrate

Semiconductor capacitor structure and method for manufacturing the same

Substrate processing apparatus

Method for cleaning substrate having exposed silicon and silicon germanium layers and related method for fabricating semiconductor device

Method of and apparatus for removing contaminants from surface of a substrate

Method of forming fine pitch hardmask patterns and method of forming fine patterns of semiconductor device using the same

Transistor having a metal nitride layer pattern, etchant and methods of forming the same

Semiconductor capacitor structure and method for manufacturing the same

Cleaning solution for silicon surface and methods of fabricating semiconductor device using the same

Method of manufacturing capacitor of semiconductor device

Method of manufacturing a semiconductor device using a polysilicon etching mask

Semiconductor device having capacitor

Semiconductor device having capacitor and method of fabricating the same

Method of fabricating semiconductor memory device having plurality of storage node electrodes

Method of manufacturing semiconductor device having storage electrode of capacitor

Substrate processing apparatus and substrate processing system including the same

Operating method for wet etching system and related system

Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture

Cleaning solution for silicon surface and methods of fabricating semiconductor device using the same

Apparatus for drying substrate and method thereof

Substrate processing apparatus and substrate processing system including the same

Method of forming a spacer

LEE HYO-SAN

Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods

Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods

Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods

KANG DAE-HYUK

Integrated circuit capacitors having sidewall supports

Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed thereby

KIM SANG-YONG

Transistor having a metal nitride layer pattern, etchant and methods of forming the same

KWON DOO-WON

Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture