Inventor
SHIOBARA EISHI
JP37 patents
⚠️ This page may combine multiple inventors who share the name “SHIOBARA EISHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
25 patentsUS6569595B1May 27, 2003
Method of forming a pattern
TOSHIBA KK58 citations96
US7009148B2Mar 7, 2006
Method of processing a substrate, heating apparatus, and method of forming a pattern
TOSHIBA KK16 citations92
US6881058B2Apr 19, 2005
Apparatus for processing substrate and method of processing the same
TOSHIBA KK14 citations92
US6576562B2Jun 10, 2003
Manufacturing method of semiconductor device using mask pattern having high etching resistance
TOSHIBA KK36 citations92
US6270948B1Aug 7, 2001
Method of forming pattern
TOSHIBA KK54 citations92
US7779777B2Aug 24, 2010
Substrate processing apparatus and method
TOSHIBA KK9 citations84
US7294586B2Nov 13, 2007
Method of processing a substrate, heating apparatus, and method of forming a pattern
TOSHIBA KK11 citations84
US7026099B2Apr 11, 2006
Pattern forming method and method for manufacturing semiconductor device
TOSHIBA KK12 citations84
US7527918B2May 5, 2009
Pattern forming method and method for manufacturing a semiconductor device
TOSHIBA KK11 citations83
US6420271B2Jul 16, 2002
Method of forming a pattern
TOSHIBA KK8 citations73
US7687227B2Mar 30, 2010
Resist pattern forming method and manufacturing method of semiconductor device
TOSHIBA KK3 citations63
US7662546B2Feb 16, 2010
Apparatus for processing substrate and method of processing the same
TOSHIBA KK2 citations63
US7368209B2May 6, 2008
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device
TOSHIBA KK3 citations63
US7005249B2Feb 28, 2006
Apparatus for processing substrate and method of processing the same
TOSHIBA KK2 citations63
US6841404B2Jan 11, 2005
Method for determining optical constant of antireflective layer, and method for forming resist pattern
TOSHIBA KK5 citations63
US7851139B2Dec 14, 2010
Pattern forming method
TOSHIBA KK2 citations61
US7662542B2Feb 16, 2010
Pattern forming method and semiconductor device manufacturing method
TOSHIBA KK4 citations61
US9958794B2May 1, 2018
Manufacturing apparatus of semiconductor device and management method of manufacturing apparatus of semiconductor device
TOSHIBA KK0 citations52
US9891524B2Feb 13, 2018
Semiconductor device and method of manufacturing the same
TOSHIBA KK0 citations52
US7973907B2Jul 5, 2011
Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate
TOSHIBA KK0 citations52
US7794923B2Sep 14, 2010
Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device
TOSHIBA KK1 citations52
US7687279B2Mar 30, 2010
Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device
TOSHIBA KK0 citations52
US7537871B2May 26, 2009
Method of manufacturing semiconductor device
TOSHIBA KK0 citations52
US7005238B2Feb 28, 2006
Apparatus for processing substrate and method of processing the same
TOSHIBA KK0 citations52
US7968272B2Jun 28, 2011
Semiconductor device manufacturing method to form resist pattern
TOSHIBA KK0 citations42
SHIOBARA EISHI
4 patentsUS8883405B2Nov 11, 2014
Method for forming pattern
SHIOBARA EISHI23 citations91
US8187797B2May 29, 2012
Method of manufacturing semiconductor device
SHIOBARA EISHI7 citations83
US8198005B2Jun 12, 2012
Method of forming resist pattern
SHIOBARA EISHI1 citations51
US8329385B2Dec 11, 2012
Method of manufacturing a semiconductor device
SHIOBARA EISHI1 citations49