Inventor
TERASHIMA TOMOHIDE
JP87 patents
⚠️ This page may combine multiple inventors who share the name “TERASHIMA TOMOHIDE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
48 patentsUS6586780B1Jul 1, 2003
Semiconductor device for supplying output voltage according to high power supply voltage
MITSUBISHI ELECTRIC CORP35 citations93
US6515349B2Feb 4, 2003
Semiconductor device and process for the same
MITSUBISHI ELECTRIC CORP24 citations93
US5894156AApr 13, 1999
Semiconductor device having a high breakdown voltage isolation region
MITSUBISHI ELECTRIC CORP46 citations93
US5889310AMar 30, 1999
Semiconductor device with high breakdown voltage island region
MITSUBISHI ELECTRIC CORP36 citations93
US5731628AMar 24, 1998
Semiconductor device having element with high breakdown voltage
MITSUBISHI ELECTRIC CORP34 citations93
US5561077AOct 1, 1996
Dielectric element isolated semiconductor device and a method of manufacturing the same
MITSUBISHI ELECTRIC CORP20 citations93
US5541430AJul 30, 1996
VDMOS semiconductor device
MITSUBISHI ELECTRIC CORP49 citations93
US5495124AFeb 27, 1996
Semiconductor device with increased breakdown voltage
MITSUBISHI ELECTRIC CORP24 citations93
US5485030AJan 16, 1996
Dielectric element isolated semiconductor device and a method of manufacturing the same
MITSUBISHI ELECTRIC CORP40 citations93
US5428241AJun 27, 1995
High breakdown voltage type semiconductor device
MITSUBISHI ELECTRIC CORP27 citations93
US5372954ADec 13, 1994
Method of fabricating an insulated gate bipolar transistor
MITSUBISHI ELECTRIC CORP30 citations93
US5360746ANov 1, 1994
Method of fabricating a semiconductor device
MITSUBISHI ELECTRIC CORP21 citations93
US5334546AAug 2, 1994
Method of forming a semiconductor device which prevents field concentration
MITSUBISHI ELECTRIC CORP22 citations93
US5204545AApr 20, 1993
Structure for preventing field concentration in semiconductor device and method of forming the same
MITSUBISHI ELECTRIC CORP40 citations93
US5164804ANov 17, 1992
Semiconductor device having high breakdown voltage and low resistance and method of fabricating the same
MITSUBISHI ELECTRIC CORP29 citations93
US6642599B1Nov 4, 2003
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP53 citations92
US6359318B1Mar 19, 2002
Semiconductor device with DMOS and bi-polar transistors
MITSUBISHI ELECTRIC CORP40 citations92
US6191466B1Feb 20, 2001
Semiconductor device containing a diode
MITSUBISHI ELECTRIC CORP21 citations92
US5455439AOct 3, 1995
Semiconductor device which moderates electric field concentration caused by a conductive film formed on a surface thereof
MITSUBISHI ELECTRIC CORP31 citations92
US6376891B1Apr 23, 2002
High voltage breakdown isolation semiconductor device and manufacturing process for making the device
MITSUBISHI ELECTRIC CORP41 citations89
US7723802B2May 25, 2010
Semiconductor device
MITSUBISHI ELECTRIC CORP11 citations84
US6894348B2May 17, 2005
Semiconductor device
MITSUBISHI ELECTRIC CORP13 citations84
US5289019AFeb 22, 1994
Insulated gate bipolar transistor
MITSUBISHI ELECTRIC CORP19 citations82
US5155569AOct 13, 1992
Thyristor device with improved turn-off characteristics
MITSUBISHI ELECTRIC CORP20 citations82
US5200638AApr 6, 1993
A semiconductor device for extracting a signal used to monitor potential of a high voltage island at a low voltage island and method of manufacturing the same
MITSUBISHI ELECTRIC CORP16 citations81
US6921945B2Jul 26, 2005
Semiconductor device with structure for improving breakdown voltage
MITSUBISHI ELECTRIC CORP7 citations74
US6642120B2Nov 4, 2003
Semiconductor circuit
MITSUBISHI ELECTRIC CORP7 citations74
US6472710B2Oct 29, 2002
Field MOS transistor and semiconductor integrated circuit including the same
MITSUBISHI ELECTRIC CORP7 citations74
US6297532B1Oct 2, 2001
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP13 citations74
US5907182AMay 25, 1999
Semiconductor device having element with high breakdown voltage
MITSUBISHI ELECTRIC CORP8 citations74
US5874767AFeb 23, 1999
Semiconductor device including a lateral power device
MITSUBISHI ELECTRIC CORP14 citations74
US5763926AJun 9, 1998
Semiconductor device having a Bi-CMOS transistor including an n-channel MOS transistor
MITSUBISHI ELECTRIC CORP6 citations74
US5624858AApr 29, 1997
Method of manufacturing a semiconductor device with increased breakdown voltage
MITSUBISHI ELECTRIC CORP8 citations74
US5500541AMar 19, 1996
Semiconductor device having voltage sensing element
MITSUBISHI ELECTRIC CORP7 citations74
US5497011AMar 5, 1996
Semiconductor memory device and a method of using the same
MITSUBISHI ELECTRIC CORP13 citations74
US5293056AMar 8, 1994
Semiconductor device with high off-breakdown-voltage and low on resistance
MITSUBISHI ELECTRIC CORP12 citations74
US5270568ADec 14, 1993
Structure for preventing electric field concentration in semiconductor device
MITSUBISHI ELECTRIC CORP13 citations74
US5194394AMar 16, 1993
Thyristor and method of manufacturing the same
MITSUBISHI ELECTRIC CORP11 citations74
US5091766AFeb 25, 1992
Thyristor with first and second independent control electrodes
MITSUBISHI ELECTRIC CORP16 citations74
US5065219ANov 12, 1991
Semiconductor device and fabrication method thereof
MITSUBISHI ELECTRIC CORP7 citations74
US4984063AJan 8, 1991
Semiconductor device
MITSUBISHI ELECTRIC CORP13 citations74
US6518158B1Feb 11, 2003
Method of manufacturing a semiconductor device including a fuse
MITSUBISHI ELECTRIC CORP7 citations73
US5279977AJan 18, 1994
Method of manufacturing a semiconductor device for extracting a signal used to monitor potential of a high voltage island
MITSUBISHI ELECTRIC CORP7 citations73
US5258641ANov 2, 1993
Semiconductor device for extracting a signal used to monitor potential of a high voltage island at a low voltage island and method of manufacturing the same
MITSUBISHI ELECTRIC CORP9 citations73
US5100814AMar 31, 1992
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP10 citations72
US11552073B2Jan 10, 2023
Semiconductor device
MITSUBISHI ELECTRIC CORP1 citations63
US7825430B2Nov 2, 2010
Semiconductor device with a high breakdown voltage device
MITSUBISHI ELECTRIC CORP6 citations63
US7786532B2Aug 31, 2010
Structure of a high breakdown voltage element for use in high power application
MITSUBISHI ELECTRIC CORP4 citations63
TERASHIMA TOMOHIDE
1 patentYAMASHITA JUNICHI
1 patentShowing the top 50 of 87 patents by PatentIndex Score.