Inventor
KOMINE NORIO
JP30 patents
Patents
30 patentsUS7423731B2Sep 9, 2008
Illumination optical system, exposure apparatus, and exposure method with polarized switching device
NIKON CORP59 citations97
US5707908AJan 13, 1998
Silica glass
NIKON CORP64 citations96
US5679125AOct 21, 1997
Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range
NIKON CORP59 citations96
US7515248B2Apr 7, 2009
Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment
NIKON CORP25 citations92
US6649268B1Nov 18, 2003
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
NIKON CORP25 citations92
US6291377B1Sep 18, 2001
Silica glass and its manufacturing method
NIKON CORP25 citations92
US6174830B1Jan 16, 2001
Silica glass having superior durability against excimer laser beams and method for manufacturing the same
NIKON CORP16 citations92
US6087283AJul 11, 2000
Silica glass for photolithography
NIKON CORP39 citations92
US6061174AMay 9, 2000
Image-focusing optical system for ultraviolet laser
NIKON CORP32 citations92
US5958809ASep 28, 1999
Fluorine-containing silica glass
NIKON CORP47 citations92
US5908482AJun 1, 1999
Method for producing a silica glass
NIKON CORP41 citations92
US5699183ADec 16, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP25 citations92
US5696624ADec 9, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP24 citations92
US6094940AAug 1, 2000
Manufacturing method of synthetic silica glass
NIKON CORP23 citations89
US6505484B1Jan 14, 2003
Forming method of silica glass and forming apparatus thereof
NIKON CORP16 citations84
US5703712ADec 30, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP11 citations82
US6587262B1Jul 1, 2003
UV synthetic silica glass optical member and reduction projection exposure apparatus using the same
NIKON CORP7 citations74
US6518210B1Feb 11, 2003
Exposure apparatus including silica glass and method for producing silica glass
NIKON CORP10 citations74
US6374639B2Apr 23, 2002
Silica glass and its manufacturing method
NIKON CORP10 citations74
US6075607AJun 13, 2000
Method for estimating durability of optical member against excimer laser irradiation and method for selecting silica glass optical member
NIKON CORP13 citations74
US6656860B2Dec 2, 2003
Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus
NIKON CORP7 citations73
US6339033B2Jan 15, 2002
Silica glass having superior durability against excimer laser beams and method for manufacturing the same
NIKON CORP9 citations73
US6320661B1Nov 20, 2001
Method for measuring transmittance of optical members for ultraviolent use, synthetic silica glass, and photolithography apparatus using the same
NIKON CORP11 citations73
US6269661B1Aug 7, 2001
Method for manufacturing optical components for use in the ultraviolet region
NIKON CORP5 citations71
US5983672ANov 16, 1999
Method for manufacturing optical components for use in the ultraviolet region
NIKON CORP12 citations71
US7515247B2Apr 7, 2009
Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device
NIKON CORP2 citations62
US6442973B1Sep 3, 2002
Synthetic silica glass and its manufacturing method
NIKON CORP6 citations62
US6835683B2Dec 28, 2004
Quartz glass member and projection aligner
NIKON CORP0 citations52
US6378340B2Apr 30, 2002
Manufacturing method of synthetic silica glass
NIKON CORP1 citations52
US7072026B2Jul 4, 2006
Exposure apparatus and optical component for the same
NIKON CORP0 citations50