Inventor
UNNO YASUYUKI
JP32 patents
⚠️ This page may combine multiple inventors who share the name “UNNO YASUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
25 patentsUS5933219AAug 3, 1999
Projection exposure apparatus and device manufacturing method capable of controlling polarization direction
CANON KK116 citations98
US5805273ASep 8, 1998
Projection exposure apparatus and microdevice manufacturing method
CANON KK115 citations98
US5459000AOct 17, 1995
Image projection method and device manufacturing method using the image projection method
CANON KK114 citations98
US6301001B1Oct 9, 2001
Optical element manufacturing system, an illumination system, and an exposure apparatus
CANON KK51 citations96
US5995285ANov 30, 1999
Multilevel optical diffraction device with antireflection film and exposure apparatus
CANON KK45 citations96
US5184176AFeb 2, 1993
Projection exposure apparatus with an aberration compensation device of a projection lens
CANON KK66 citations94
US6641985B2Nov 4, 2003
Method for making element
CANON KK32 citations93
US6476869B1Nov 5, 2002
Image processing system and method using system characteristic and image information
CANON KK33 citations93
US6829041B2Dec 7, 2004
Projection optical system and projection exposure apparatus having the same
CANON KK21 citations92
US6327086B1Dec 4, 2001
Optical diffraction device and exposure apparatus
CANON KK29 citations92
US6120950ASep 19, 2000
Optical element manufacturing method
CANON KK28 citations92
US6077631AJun 20, 2000
Photomask and scanning exposure apparatus and device manufacturing method using same
CANON KK29 citations92
US5872617AFeb 16, 1999
Scanning type exposure apparatus and device manufacturing method
CANON KK29 citations92
US5953106ASep 14, 1999
Projection optical system, exposure apparatus and semiconductor-device manufacturing method using the system
CANON KK41 citations91
US7508598B2Mar 24, 2009
Apparatus for measuring aerial images produced by an optical lithography system
CANON KK7 citations74
US5706077AJan 6, 1998
Scan type projection exposure apparatus and microdevice manufacturing method using the same
CANON KK8 citations74
US9170171B2Oct 27, 2015
Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium
CANON KK2 citations63
US7262920B2Aug 28, 2007
Optical element and manufacturing method therefor
CANON KK3 citations63
US7102828B2Sep 5, 2006
Optical element and manufacturing method thereof
CANON KK4 citations63
US9347853B2May 24, 2016
Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium
CANON KK0 citations52
US7911709B2Mar 22, 2011
Apparatus and method for improving detected resolution and/or intensity of a sampled image
CANON KK0 citations52
US12326668B2Jun 10, 2025
Detection apparatus, lithography apparatus, and article manufacturing method
CANON KK0 citations51
US12098913B2Sep 24, 2024
Detector that detects relative positions of marks while blocking non-interference light
CANON KK0 citations50
US12596310B2Apr 7, 2026
Detection device, lithography apparatus, and article manufacturing method
CANON KK0 citations46
US10777440B2Sep 15, 2020
Detection device, imprint apparatus, planarization device, detection method, and article manufacturing method
CANON KK0 citations40
MATSUBARA ISAO
3 patentsUS8896840B2Nov 25, 2014
Interferometric method and digital holographic microscope
MATSUBARA ISAO4 citations70
US8531747B2Sep 10, 2013
Hologram, hologram data generation method, and exposure apparatus
MATSUBARA ISAO2 citations60
US9116303B2Aug 25, 2015
Hologram with cells to control phase in two polarization directions and exposure apparatus
MATSUBARA ISAO0 citations38