Inventor
VAN DER ZOUW GERBRAND
NL20 patents
⚠️ This page may combine multiple inventors who share the name “VAN DER ZOUW GERBRAND”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
19 patentsUS8921814B2Dec 30, 2014
Photon source, metrology apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV28 citations90
US10126237B2Nov 13, 2018
Inspection apparatus and device manufacturing method
ASML NETHERLANDS BV7 citations83
US9357626B2May 31, 2016
Photon source, metrology apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV7 citations82
US10338401B2Jul 2, 2019
Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method
ASML NETHERLANDS BV2 citations73
US10191391B2Jan 29, 2019
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV4 citations72
US10983445B2Apr 20, 2021
Method and apparatus for measuring a parameter of interest using image plane detection techniques
ASML NETHERLANDS BV3 citations71
US10534274B2Jan 14, 2020
Method of inspecting a substrate, metrology apparatus, and lithographic system
ASML NETHERLANDS BV2 citations71
US10437159B2Oct 8, 2019
Measurement system, lithographic system, and method of measuring a target
ASML NETHERLANDS BV2 citations71
US10795269B2Oct 6, 2020
Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method
ASML NETHERLANDS BV3 citations70
US7409302B2Aug 5, 2008
Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus
ASML NETHERLANDS BV6 citations70
US10303064B2May 28, 2019
Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method
ASML NETHERLANDS BV2 citations68
US6891598B2May 10, 2005
Lithographic device and method for wafer alignment with reduced tilt sensitivity
ASML NETHERLANDS BV3 citations62
US10551308B2Feb 4, 2020
Focus control arrangement and method
ASML NETHERLANDS BV1 citations57
US7773235B2Aug 10, 2010
Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus
ASML NETHERLANDS BV1 citations56
US9753296B2Sep 5, 2017
Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method
ASML NETHERLANDS BV1 citations52
US10423077B2Sep 24, 2019
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV0 citations51
US12460971B2Nov 4, 2025
Wavelength selection module, illumination system and metrology system
ASML NETHERLANDS BV0 citations50
US10215954B2Feb 26, 2019
Focus monitoring arrangement and inspection apparatus including such an arrangement
ASML NETHERLANDS BV0 citations41
US8384881B2Feb 26, 2013
Lithographic apparatus, stage apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations41