Inventor
LIN DHEI-JHAI
TW8 patents
⚠️ This page may combine multiple inventors who share the name “LIN DHEI-JHAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IND TECH RES INST
7 patentsUS5718991AFeb 17, 1998
Method for making photomasks having regions of different light transmissivities
IND TECH RES INST42 citations88
US5304453AApr 19, 1994
Method for preparing resist patterns through image layer transfer to a receiver substrate, via a photo-hardening organic liquid adhesive, with subsequent oxygen reactive ion etching
IND TECH RES INST19 citations72
US5242780ASep 7, 1993
Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups
IND TECH RES INST18 citations72
US5229245AJul 20, 1993
Positively working photosensitive composition
IND TECH RES INST11 citations72
US5019483AMay 28, 1991
Aqueous developable photoresist containing weak alkali soluble or dispersible thiol compounds
IND TECH RES INST15 citations72
US5153102AOct 6, 1992
Alkalline-solution-developable liquid photographic composition
IND TECH RES INST13 citations70
US5275913AJan 4, 1994
Method for preparing resist patterns utilizing solvent development with subsequent resist pattern transfer, via a photo-hardening liquid adhesive, to a receiver substrate and oxygen reactive ion etching
IND TECH RES INST6 citations61