Inventor
HAYAMI TOSHIHIRO
JP30 patents
⚠️ This page may combine multiple inventors who share the name “HAYAMI TOSHIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
13 patentsUS7951262B2May 31, 2011
Plasma processing apparatus and method
TOKYO ELECTRON LTD486 citations99
US7988816B2Aug 2, 2011
Plasma processing apparatus and method
TOKYO ELECTRON LTD63 citations97
US7718007B2May 18, 2010
Substrate supporting member and substrate processing apparatus
TOKYO ELECTRON LTD23 citations92
US9490105B2Nov 8, 2016
Plasma processing apparatus and method
TOKYO ELECTRON LTD6 citations84
US7895970B2Mar 1, 2011
Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component
TOKYO ELECTRON LTD18 citations84
US7815740B2Oct 19, 2010
Substrate mounting table, substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD19 citations84
US10854431B2Dec 1, 2020
Plasma processing apparatus and method
TOKYO ELECTRON LTD2 citations73
US10546727B2Jan 28, 2020
Plasma processing apparatus and method
TOKYO ELECTRON LTD2 citations73
US7368876B2May 6, 2008
Plasma processing apparatus
TOKYO ELECTRON LTD3 citations61
US7870751B2Jan 18, 2011
Temperature control system and substrate processing apparatus
TOKYO ELECTRON LTD3 citations60
US7767055B2Aug 3, 2010
Capacitive coupling plasma processing apparatus
TOKYO ELECTRON LTD5 citations59
US8038833B2Oct 18, 2011
Plasma processing apparatus
TOKYO ELECTRON LTD2 citations55
US10529539B2Jan 7, 2020
Plasma processing apparatus and method
TOKYO ELECTRON LTD0 citations52
SUMITOMO METAL IND
7 patentsUS5705019AJan 6, 1998
Plasma processing apparatus
SUMITOMO METAL IND86 citations96
US5885472AMar 23, 1999
Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof
SUMITOMO METAL IND53 citations95
US6091045AJul 18, 2000
Plasma processing apparatus utilizing a microwave window having a thinner inner area
SUMITOMO METAL IND41 citations89
US5951887ASep 14, 1999
Plasma processing apparatus and plasma processing method
SUMITOMO METAL IND19 citations89
US5626714AMay 6, 1997
Method for detecting etching endpoint and etching apparatus and etching system using the method thereof
SUMITOMO METAL IND17 citations81
US6669810B1Dec 30, 2003
Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof
SUMITOMO METAL IND4 citations62
US6149761ANov 21, 2000
Etching apparatus and etching system using the method thereof
SUMITOMO METAL IND2 citations62
HAYAMI TOSHIHIRO
4 patentsUS8628640B2Jan 14, 2014
Plasma processing unit and high-frequency electric power supplying unit
HAYAMI TOSHIHIRO3 citations58
US8286581B2Oct 16, 2012
High frequency power source and its control method, and plasma processing apparatus
HAYAMI TOSHIHIRO5 citations57
US8852388B2Oct 7, 2014
Plasma processor
HAYAMI TOSHIHIRO0 citations40
US8771461B2Jul 8, 2014
Plasma processing apparatus
HAYAMI TOSHIHIRO0 citations39