Inventor
KIKUGAWA SHINYA
JP30 patents
⚠️ This page may combine multiple inventors who share the name “KIKUGAWA SHINYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASAHI GLASS CO LTD
22 patentsUS5326729AJul 5, 1994
Transparent quartz glass and process for its production
ASAHI GLASS CO LTD81 citations95
US7419924B2Sep 2, 2008
Silica glass containing TiO2 and process for its production
ASAHI GLASS CO LTD21 citations92
US6829084B2Dec 7, 2004
Ultraviolet and vacuum ultraviolet antireflection substrate
ASAHI GLASS CO LTD22 citations92
US6576578B1Jun 10, 2003
Synthetic quartz glass and method for preparing the same
ASAHI GLASS CO LTD32 citations92
US6544914B1Apr 8, 2003
Synthetic quartz glass for optical member, process for producing the same, and method of using the same
ASAHI GLASS CO LTD29 citations92
US6499317B1Dec 31, 2002
Synthetic quartz glass and method for production thereof
ASAHI GLASS CO LTD32 citations92
US5330941AJul 19, 1994
Quartz glass substrate for polysilicon thin film transistor liquid crystal display
ASAHI GLASS CO LTD29 citations91
US6475575B1Nov 5, 2002
Pellicle and method for manufacture thereof
ASAHI GLASS CO LTD24 citations89
US7989378B2Aug 2, 2011
TiO2-containing silica glass
ASAHI GLASS CO LTD15 citations84
US6795170B2Sep 21, 2004
Structure for attaching a pellicle to a photo-mask
ASAHI GLASS CO LTD16 citations80
US7022633B2Apr 4, 2006
Synthetic quartz glass and process for producing it
ASAHI GLASS CO LTD6 citations73
US6628456B2Sep 30, 2003
Ultraviolet and vacuum ultraviolet antireflection substrate
ASAHI GLASS CO LTD9 citations73
US6611317B1Aug 26, 2003
Exposure apparatus, semiconductor device, and photomask
ASAHI GLASS CO LTD11 citations73
US6744562B2Jun 1, 2004
Pellicle
ASAHI GLASS CO LTD9 citations72
US6436361B1Aug 20, 2002
Silicon carbide and process for its production
ASAHI GLASS CO LTD9 citations69
US7592063B2Sep 22, 2009
Quartz glass substrate and process for its production
ASAHI GLASS CO LTD3 citations63
US8034731B2Oct 11, 2011
TIO2-containing silica glass and optical member for lithography using the same
ASAHI GLASS CO LTD5 citations62
US7998892B2Aug 16, 2011
TiO2-containing silica glass and optical member for lithography using the same
ASAHI GLASS CO LTD3 citations62
US7585800B2Sep 8, 2009
Silica glass and optical material
ASAHI GLASS CO LTD5 citations62
US6713200B2Mar 30, 2004
Pellicle and method of using the same
ASAHI GLASS CO LTD2 citations59
US7491475B2Feb 17, 2009
Photomask substrate made of synthetic quartz glass and photomask
ASAHI GLASS CO LTD0 citations48
US7784307B2Aug 31, 2010
Optical member made of synthetic quartz glass, and process for its production
ASAHI GLASS CO LTD0 citations41
AGC INC
2 patentsKOIKE AKIO
2 patentsUS8093165B2Jan 10, 2012
TiO2-containing silica glass and optical member for EUV lithography using the same
KOIKE AKIO8 citations82
US8178450B2May 15, 2012
TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture
KOIKE AKIO0 citations47