Inventor
MIKHAYLICHENKO KATRINA
US40 patents
⚠️ This page may combine multiple inventors who share the name “MIKHAYLICHENKO KATRINA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
20 patentsUS6951042B1Oct 4, 2005
Brush scrubbing-high frequency resonating wafer processing system and methods for making and implementing the same
LAM RES CORP50 citations96
US6733596B1May 11, 2004
Substrate cleaning brush preparation sequence, method, and system
LAM RES CORP66 citations96
US7007333B1Mar 7, 2006
System and method for a combined contact and non-contact wafer cleaning module
LAM RES CORP25 citations92
US6770151B1Aug 3, 2004
Drying a substrate using a combination of substrate processing technologies
LAM RES CORP55 citations92
US7862662B2Jan 4, 2011
Method and material for cleaning a substrate
LAM RES CORP10 citations84
US7799141B2Sep 21, 2010
Method and system for using a two-phases substrate cleaning compound
LAM RES CORP8 citations84
US7737097B2Jun 15, 2010
Method for removing contamination from a substrate and for making a cleaning solution
LAM RES CORP11 citations84
US7696141B2Apr 13, 2010
Cleaning compound and method and system for using the cleaning compound
LAM RES CORP10 citations84
US7648584B2Jan 19, 2010
Method and apparatus for removing contamination from substrate
LAM RES CORP9 citations84
US6949411B1Sep 27, 2005
Method for post-etch and strip residue removal on coral films
LAM RES CORP15 citations84
US7032269B2Apr 25, 2006
Brush scrubbing-high frequency resonating substrate processing system
LAM RES CORP7 citations74
US7743449B2Jun 29, 2010
System and method for a combined contact and non-contact wafer cleaning module
LAM RES CORP7 citations73
US6611326B1Aug 26, 2003
System and apparatus for evaluating the effectiveness of wafer drying operations
LAM RES CORP7 citations71
US6521050B1Feb 18, 2003
Methods for evaluating advanced wafer drying techniques
LAM RES CORP9 citations71
US8367594B2Feb 5, 2013
Damage free, high-efficiency, particle removal cleaner comprising polyvinyl alcohol particles
LAM RES CORP3 citations63
US7067016B1Jun 27, 2006
Chemically assisted mechanical cleaning of MRAM structures
LAM RES CORP2 citations63
US7806126B1Oct 5, 2010
Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the same
LAM RES CORP5 citations61
US6851436B1Feb 8, 2005
Substrate processing using a fluid re-circulation system in a wafer scrubbing system
LAM RES CORP5 citations61
US7897213B2Mar 1, 2011
Methods for contained chemical surface treatment
LAM RES CORP0 citations52
US8011116B2Sep 6, 2011
Substrate proximity drying using in-situ local heating of substrate
LAM RES CORP0 citations50
FREER ERIK M
10 patentsUS8316866B2Nov 27, 2012
Method and apparatus for cleaning a semiconductor substrate
FREER ERIK M6 citations84
US8716210B2May 6, 2014
Material for cleaning a substrate
FREER ERIK M4 citations73
US8522801B2Sep 3, 2013
Method and apparatus for cleaning a semiconductor substrate
FREER ERIK M6 citations73
US8480810B2Jul 9, 2013
Method and apparatus for particle removal
FREER ERIK M5 citations73
US8475599B2Jul 2, 2013
Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions
FREER ERIK M6 citations73
US8522799B2Sep 3, 2013
Apparatus and system for cleaning a substrate
FREER ERIK M6 citations72
US8608859B2Dec 17, 2013
Method for removing contamination from a substrate and for making a cleaning solution
FREER ERIK M2 citations62
US8591662B2Nov 26, 2013
Methods for cleaning a semiconductor substrate
FREER ERIK M4 citations62
US8555903B2Oct 15, 2013
Method and apparatus for removing contamination from substrate
FREER ERIK M2 citations62
US8137474B2Mar 20, 2012
Cleaning compound and method and system for using the cleaning compound
FREER ERIK M4 citations62
MIKHAYLICHENKO KATRINA
5 patentsUS8062471B2Nov 22, 2011
Proximity head heating method and apparatus
MIKHAYLICHENKO KATRINA11 citations82
US8440573B2May 14, 2013
Method and apparatus for pattern collapse free wet processing of semiconductor devices
MIKHAYLICHENKO KATRINA4 citations59
US8102014B2Jan 24, 2012
Proximity head heating method and apparatus
MIKHAYLICHENKO KATRINA0 citations50
US8324114B2Dec 4, 2012
Method and apparatus for silicon oxide residue removal
MIKHAYLICHENKO KATRINA1 citations45
US8652266B2Feb 18, 2014
Method and apparatus for surface treatment of semiconductor substrates using sequential chemical applications
MIKHAYLICHENKO KATRINA0 citations39