P

Inventor

GOO JUNG-SUK

US34 patents
⚠️ This page may combine multiple inventors who share the name “GOO JUNG-SUK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

22 patents
US6800910B2Oct 5, 2004

FinFET device incorporating strained silicon in the channel region

ADVANCED MICRO DEVICES INC295 citations99
US7138302B2Nov 21, 2006

Method of fabricating an integrated circuit channel region

ADVANCED MICRO DEVICES INC70 citations98
US7078299B2Jul 18, 2006

Formation of finFET using a sidewall epitaxial layer

ADVANCED MICRO DEVICES INC118 citations98
US6902991B2Jun 7, 2005

Semiconductor device having a thick strained silicon layer and method of its formation

ADVANCED MICRO DEVICES INC76 citations98
US6955969B2Oct 18, 2005

Method of growing as a channel region to reduce source/drain junction capacitance

ADVANCED MICRO DEVICES INC89 citations97
US6943087B1Sep 13, 2005

Semiconductor on insulator MOSFET having strained silicon channel

ADVANCED MICRO DEVICES INC59 citations96
US6929992B1Aug 16, 2005

Strained silicon MOSFETs having NMOS gates with work functions for compensating NMOS threshold voltage shift

ADVANCED MICRO DEVICES INC78 citations96
US7170084B1Jan 30, 2007

Strained silicon MOSFET having improved source/drain extension dopant diffusion resistance and method for its fabrication

ADVANCED MICRO DEVICES INC21 citations93
US7015078B1Mar 21, 2006

Silicon on insulator substrate having improved thermal conductivity and method of its formation

ADVANCED MICRO DEVICES INC28 citations93
US6730576B1May 4, 2004

Method of forming a thick strained silicon layer and semiconductor structures incorporating a thick strained silicon layer

ADVANCED MICRO DEVICES INC28 citations93
US7033869B1Apr 25, 2006

Strained silicon semiconductor on insulator MOSFET

ADVANCED MICRO DEVICES INC48 citations92
US6936516B1Aug 30, 2005

Replacement gate strained silicon finFET process

ADVANCED MICRO DEVICES INC38 citations92
US7176531B1Feb 13, 2007

CMOS gates formed by integrating metals having different work functions and having a high-k gate dielectric

ADVANCED MICRO DEVICES INC22 citations91
US6872613B1Mar 29, 2005

Method for integrating metals having different work functions to form CMOS gates having a high-k gate dielectric and related structure

ADVANCED MICRO DEVICES INC28 citations91
US7012007B1Mar 14, 2006

Strained silicon MOSFET having improved thermal conductivity and method for its fabrication

ADVANCED MICRO DEVICES INC16 citations84
US6900143B1May 31, 2005

Strained silicon MOSFETs having improved thermal dissipation

ADVANCED MICRO DEVICES INC18 citations84
US6756276B1Jun 29, 2004

Strained silicon MOSFET having improved source/drain extension dopant diffusion resistance and method for its fabrication

ADVANCED MICRO DEVICES INC13 citations84
US7462549B2Dec 9, 2008

Shallow trench isolation process and structure with minimized strained silicon consumption

ADVANCED MICRO DEVICES INC5 citations74
US6962857B1Nov 8, 2005

Shallow trench isolation process using oxide deposition and anneal

ADVANCED MICRO DEVICES INC10 citations74
US6858503B1Feb 22, 2005

Depletion to avoid cross contamination

ADVANCED MICRO DEVICES INC10 citations74
US7761823B2Jul 20, 2010

Method for adjusting a transistor model for increased circuit simulation accuracy

ADVANCED MICRO DEVICES INC2 citations63
US7977172B2Jul 12, 2011

Dynamic random access memory (DRAM) cells and methods for fabricating the same

ADVANCED MICRO DEVICES INC5 citations62

GLOBALFOUNDRIES INC

4 patents

LG SEMICON CO LTD

2 patents

TOPALOGLU RASIT O

1 patent

WASON VINEET

1 patent

CHO HYUN-JIN

1 patent

GOO JUNG-SUK

1 patent

MADHAVAN SRIRAM

1 patent

CHEN QIANG

1 patent