Inventor
LIANG FU-JYE
TW21 patents
⚠️ This page may combine multiple inventors who share the name “LIANG FU-JYE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
9 patentsUS6982135B2Jan 3, 2006
Pattern compensation for stitching
TAIWAN SEMICONDUCTOR MFG54 citations95
US9158209B2Oct 13, 2015
Method of overlay prediction
TAIWAN SEMICONDUCTOR MFG5 citations73
US7939222B2May 10, 2011
Method and system for improving printing accuracy of a contact layout
TAIWAN SEMICONDUCTOR MFG3 citations61
US8592107B2Nov 26, 2013
Method and apparatus of providing overlay
TAIWAN SEMICONDUCTOR MFG0 citations51
US9360767B2Jun 7, 2016
Method and apparatus for maintaining depth of focus
TAIWAN SEMICONDUCTOR MFG0 citations50
US9025130B2May 5, 2015
Method and apparatus for maintaining depth of focus
TAIWAN SEMICONDUCTOR MFG0 citations50
US7723014B2May 25, 2010
System and method for photolithography in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG0 citations47
US7675604B2Mar 9, 2010
Hood for immersion lithography
TAIWAN SEMICONDUCTOR MFG0 citations40
US7666576B2Feb 23, 2010
Exposure scan and step direction optimization
TAIWAN SEMICONDUCTOR MFG0 citations39
TAIWAN SEMICONDUCTOR MFG CO LTD
9 patentsUS10642158B2May 5, 2020
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10366973B2Jul 30, 2019
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10146141B2Dec 4, 2018
Lithography process and system with enhanced overlay quality
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11594528B2Feb 28, 2023
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11150561B2Oct 19, 2021
Method and apparatus for collecting information used in image-error compensation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11024623B2Jun 1, 2021
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10871713B2Dec 22, 2020
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10712651B2Jul 14, 2020
Method and apparatus for collecting information used in image-error compensation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10720419B2Jul 21, 2020
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52