Inventor
KATAYAMA KAZUHIRO
JP62 patents
⚠️ This page may combine multiple inventors who share the name “KATAYAMA KAZUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
33 patentsUS9250523B2Feb 2, 2016
Resist composition and patterning process
SHINETSU CHEMICAL CO7 citations84
US11774853B2Oct 3, 2023
Resist composition and patterning process
SHINETSU CHEMICAL CO5 citations75
US11560355B2Jan 24, 2023
Onium salt, chemically amplified resist composition, and patterning process
SHINETSU CHEMICAL CO4 citations75
US11009793B2May 18, 2021
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO4 citations73
US10120278B2Nov 6, 2018
Carboxylic acid onium salt, chemically amplified resist composition, and pattern forming process
SHINETSU CHEMICAL CO4 citations73
US10023674B2Jul 17, 2018
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO3 citations73
US9618850B2Apr 11, 2017
Pattern forming process and shrink agent
SHINETSU CHEMICAL CO3 citations73
US9274425B2Mar 1, 2016
Resist composition and patterning process
SHINETSU CHEMICAL CO4 citations73
US9182668B2Nov 10, 2015
Patterning process, resist composition, polymer, and monomer
SHINETSU CHEMICAL CO4 citations73
US9081290B2Jul 14, 2015
Patterning process and resist composition
SHINETSU CHEMICAL CO6 citations72
US11448961B2Sep 20, 2022
Iodonium salt, resist composition, and pattern forming process
SHINETSU CHEMICAL CO1 citations63
US9213235B2Dec 15, 2015
Patterning process, resist composition, polymer, and monomer
SHINETSU CHEMICAL CO2 citations63
US9091933B2Jul 28, 2015
Negative pattern forming process
SHINETSU CHEMICAL CO2 citations63
US11940728B2Mar 26, 2024
Molecular resist composition and patterning process
SHINETSU CHEMICAL CO1 citations61
US10754248B2Aug 25, 2020
Sulfonium salt, resist composition, and patterning process
SHINETSU CHEMICAL CO1 citations61
US12275693B2Apr 15, 2025
Onium salt, chemically amplified resist composition and patterning process
SHINETSU CHEMICAL CO0 citations52
US12216401B2Feb 4, 2025
Sulfonium salt, chemically amplified resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations52
US11953827B2Apr 9, 2024
Molecular resist composition and patterning process
SHINETSU CHEMICAL CO0 citations52
US11022881B2Jun 1, 2021
Photoacid generator, chemically amplified resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations52
US10921710B2Feb 16, 2021
Resist composition and pattern forming process
SHINETSU CHEMICAL CO0 citations52
US10591819B2Mar 17, 2020
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations52
US10527939B2Jan 7, 2020
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations52
US9632415B2Apr 25, 2017
Pattern forming process and shrink agent
SHINETSU CHEMICAL CO1 citations52
US9235122B2Jan 12, 2016
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations52
US9086625B2Jul 21, 2015
Resist composition and patterning process
SHINETSU CHEMICAL CO1 citations52
US9057949B2Jun 16, 2015
Patterning process, resist composition, polymer, and polymerizable ester compound
SHINETSU CHEMICAL CO1 citations52
US9046772B2Jun 2, 2015
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO1 citations52
US8993222B2Mar 31, 2015
Pattern forming process
SHINETSU CHEMICAL CO1 citations52
US8932803B2Jan 13, 2015
Pattern forming process
SHINETSU CHEMICAL CO1 citations52
US8877424B2Nov 4, 2014
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO1 citations52
US8741546B2Jun 3, 2014
Patterning process and resist composition
SHINETSU CHEMICAL CO1 citations52
US12535733B2Jan 27, 2026
Molecular resist composition and patterning process
SHINETSU CHEMICAL CO0 citations50
US11687000B2Jun 27, 2023
Sulfonium compound, chemically amplified resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations48
HATAKEYAMA JUN
12 patentsUS8057982B2Nov 15, 2011
Monomer, resist composition, and patterning process
HATAKEYAMA JUN33 citations93
US8895231B2Nov 25, 2014
Patterning process and resist composition
HATAKEYAMA JUN7 citations84
US8507173B2Aug 13, 2013
Patterning process
HATAKEYAMA JUN10 citations84
US8507175B2Aug 13, 2013
Patterning process and resist composition
HATAKEYAMA JUN13 citations84
US8426115B2Apr 23, 2013
Patterning process and resist composition
HATAKEYAMA JUN9 citations84
US8198016B2Jun 12, 2012
Patterning process
HATAKEYAMA JUN13 citations84
US8105760B2Jan 31, 2012
Patterning process and pattern surface coating composition
HATAKEYAMA JUN11 citations84
US9029064B2May 12, 2015
Patterning process and resist composition
HATAKEYAMA JUN2 citations63
US8741554B2Jun 3, 2014
Patterning process and resist composition
HATAKEYAMA JUN2 citations63
US8617800B2Dec 31, 2013
Patterning process
HATAKEYAMA JUN3 citations63
US8999630B2Apr 7, 2015
Patterning process and resist composition
HATAKEYAMA JUN1 citations52
US8790866B2Jul 29, 2014
Patterning process and resist composition
HATAKEYAMA JUN0 citations52
WATANABE TAKERU
2 patentsHITACHI LTD
1 patentSHARP KK
1 patentTAKEMURA KATSUYA
1 patentShowing the top 50 of 62 patents by PatentIndex Score.