P

Inventor

PEIDOUS IGOR V

US18 patents
⚠️ This page may combine multiple inventors who share the name “PEIDOUS IGOR V”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHARTERED SEMICONDUCTOR MFG

16 patents
US5989978ANov 23, 1999

Shallow trench isolation of MOSFETS with reduced corner parasitic currents

CHARTERED SEMICONDUCTOR MFG393 citations98
US6027982AFeb 22, 2000

Method to form shallow trench isolation structures with improved isolation fill and surface planarity

CHARTERED SEMICONDUCTOR MFG57 citations94
US5930646AJul 27, 1999

Method of shallow trench isolation

CHARTERED SEMICONDUCTOR MFG62 citations93
US6049107AApr 11, 2000

Sub-quarter-micron MOSFET and method of its manufacturing

CHARTERED SEMICONDUCTOR MFG20 citations92
US5937297AAug 10, 1999

Method for making sub-quarter-micron MOSFET

CHARTERED SEMICONDUCTOR MFG34 citations92
US5789305AAug 4, 1998

Locos with bird's beak suppression by a nitrogen implantation

CHARTERED SEMICONDUCTOR MFG21 citations92
US5721174AFeb 24, 1998

Narrow deep trench isolation process with trench filling by oxidation

CHARTERED SEMICONDUCTOR MFG27 citations92
US6249035B1Jun 19, 2001

LOCOS mask for suppression of narrow space field oxide thinning and oxide punch through effect

CHARTERED SEMICONDUCTOR MFG17 citations88
US6022768AFeb 8, 2000

Method and mask structure for self-aligning ion implanting to form various device structures

CHARTERED SEMICONDUCTOR MFG13 citations82
US6271575B1Aug 7, 2001

Method and mask structure for self-aligning ion implanting to form various device structures

CHARTERED SEMICONDUCTOR MFG10 citations73
US6027963AFeb 22, 2000

Method and mask structure for self-aligning ion implanting to form various device structures

CHARTERED SEMICONDUCTOR MFG5 citations73
US6001700ADec 14, 1999

Method and mask structure for self-aligning ion implanting to form various device structures

CHARTERED SEMICONDUCTOR MFG4 citations73
US5849613ADec 15, 1998

Method and mask structure for self-aligning ion implanting to form various device structures

CHARTERED SEMICONDUCTOR MFG8 citations73
US5894059AApr 13, 1999

Dislocation free local oxidation of silicon with suppression of narrow space field oxide thinning effect

CHARTERED SEMICONDUCTOR MFG15 citations71
US6071793AJun 6, 2000

Locos mask for suppression of narrow space field oxide thinning and oxide punch through effect

CHARTERED SEMICONDUCTOR MFG12 citations69
US6380610B1Apr 30, 2002

Dislocation free local oxidation of silicon with suppression of narrow space field oxide thinning effect

CHARTERED SEMICONDUCTOR MFG0 citations49

WARD MICHAEL G

2 patents