Inventor
PEIDOUS IGOR V
US18 patents
⚠️ This page may combine multiple inventors who share the name “PEIDOUS IGOR V”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CHARTERED SEMICONDUCTOR MFG
16 patentsUS5989978ANov 23, 1999
Shallow trench isolation of MOSFETS with reduced corner parasitic currents
CHARTERED SEMICONDUCTOR MFG393 citations98
US6027982AFeb 22, 2000
Method to form shallow trench isolation structures with improved isolation fill and surface planarity
CHARTERED SEMICONDUCTOR MFG57 citations94
US5930646AJul 27, 1999
Method of shallow trench isolation
CHARTERED SEMICONDUCTOR MFG62 citations93
US6049107AApr 11, 2000
Sub-quarter-micron MOSFET and method of its manufacturing
CHARTERED SEMICONDUCTOR MFG20 citations92
US5937297AAug 10, 1999
Method for making sub-quarter-micron MOSFET
CHARTERED SEMICONDUCTOR MFG34 citations92
US5789305AAug 4, 1998
Locos with bird's beak suppression by a nitrogen implantation
CHARTERED SEMICONDUCTOR MFG21 citations92
US5721174AFeb 24, 1998
Narrow deep trench isolation process with trench filling by oxidation
CHARTERED SEMICONDUCTOR MFG27 citations92
US6249035B1Jun 19, 2001
LOCOS mask for suppression of narrow space field oxide thinning and oxide punch through effect
CHARTERED SEMICONDUCTOR MFG17 citations88
US6022768AFeb 8, 2000
Method and mask structure for self-aligning ion implanting to form various device structures
CHARTERED SEMICONDUCTOR MFG13 citations82
US6271575B1Aug 7, 2001
Method and mask structure for self-aligning ion implanting to form various device structures
CHARTERED SEMICONDUCTOR MFG10 citations73
US6027963AFeb 22, 2000
Method and mask structure for self-aligning ion implanting to form various device structures
CHARTERED SEMICONDUCTOR MFG5 citations73
US6001700ADec 14, 1999
Method and mask structure for self-aligning ion implanting to form various device structures
CHARTERED SEMICONDUCTOR MFG4 citations73
US5849613ADec 15, 1998
Method and mask structure for self-aligning ion implanting to form various device structures
CHARTERED SEMICONDUCTOR MFG8 citations73
US5894059AApr 13, 1999
Dislocation free local oxidation of silicon with suppression of narrow space field oxide thinning effect
CHARTERED SEMICONDUCTOR MFG15 citations71
US6071793AJun 6, 2000
Locos mask for suppression of narrow space field oxide thinning and oxide punch through effect
CHARTERED SEMICONDUCTOR MFG12 citations69
US6380610B1Apr 30, 2002
Dislocation free local oxidation of silicon with suppression of narrow space field oxide thinning effect
CHARTERED SEMICONDUCTOR MFG0 citations49