Inventor

OIKAWA TOMO

JP10 patents

⚠️ This page may combine multiple inventors who share the name “OIKAWA TOMO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MARUZEN PETROCHEM CO LTD

5 patents

US7045582B2May 16, 2006

Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process

MARUZEN PETROCHEM CO LTD3 citations61

US7695889B2Apr 13, 2010

Copolymer for semiconductor lithography and process for production thereof

MARUZEN PETROCHEM CO LTD4 citations60

US9023982B2May 5, 2015

Method for purifying resin for photolithography

MARUZEN PETROCHEM CO LTD0 citations48

US5945544AAug 31, 1999

Process for production of N-vinyllactam

MARUZEN PETROCHEM CO LTD0 citations40

US8759462B2Jun 24, 2014

Method for producing resist copolymer having low molecular weight

MARUZEN PETROCHEM CO LTD0 citations38

OIKAWA TOMO

2 patents

US8455596B2Jun 4, 2013

Method for producing a copolymer for photoresist

OIKAWA TOMO4 citations56

US8859180B2Oct 14, 2014

Copolymer and composition for semiconductor lithography and process for producing the copolymer

OIKAWA TOMO0 citations34

YAMAGISHI TAKANORI

2 patents

US8211615B2Jul 3, 2012

Copolymer for immersion lithography and compositions

YAMAGISHI TAKANORI1 citations45

US8163852B2Apr 24, 2012

Resist polymer and method for producing the polymer

YAMAGISHI TAKANORI0 citations39

TOKYO OHKA KOGYO CO LTD

1 patent

US7972762B2Jul 5, 2011

Positive resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations39