Inventor
HUNG YUNG TAI
TW19 patents
⚠️ This page may combine multiple inventors who share the name “HUNG YUNG TAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MACRONIX INT CO LTD
15 patentsUS8047899B2Nov 1, 2011
Pad and method for chemical mechanical polishing
MACRONIX INT CO LTD25 citations92
US6750117B1Jun 15, 2004
Shallow trench isolation process
MACRONIX INT CO LTD50 citations89
US6565705B2May 20, 2003
Wafer carrier used for chemical mechanic polishing
MACRONIX INT CO LTD10 citations72
US10388664B2Aug 20, 2019
Integrated circuit device with layered trench conductors
MACRONIX INT CO LTD5 citations71
US10892265B2Jan 12, 2021
Word line structure and method of manufacturing the same
MACRONIX INT CO LTD0 citations62
US7199018B2Apr 3, 2007
Plasma assisted pre-planarization process
MACRONIX INT CO LTD2 citations61
US7491621B2Feb 17, 2009
Method of forming isolation structures in a semiconductor manufacturing process
MACRONIX INT CO LTD2 citations60
US6824452B1Nov 30, 2004
Polishing pad and process of chemical mechanical use thereof
MACRONIX INT CO LTD4 citations60
US7544618B2Jun 9, 2009
Two-step chemical mechanical polishing process
MACRONIX INT CO LTD0 citations51
US7361601B2Apr 22, 2008
Chemical mechanical polish process and method for improving accuracy of determining polish endpoint thereof
MACRONIX INT CO LTD1 citations51
US9070634B1Jun 30, 2015
Semiconductor device comprising a surface portion implanted with nitrogen and fluorine
MACRONIX INT CO LTD0 citations47
US9685373B2Jun 20, 2017
Conductive plug and method of forming the same
MACRONIX INT CO LTD0 citations46
US9252102B2Feb 2, 2016
Semiconductor structure and method for manufacturing the same
MACRONIX INT CO LTD0 citations46
US9431287B2Aug 30, 2016
Chemical mechanical planarization process and structures
MACRONIX INT CO LTD0 citations41
US7786023B2Aug 31, 2010
Metal pad formation method and metal pad structure using the same
MACRONIX INT CO LTD0 citations40