Inventor
LEINHOS UWE
DE5 patents
Patents
5 patentsUS6389045B1May 14, 2002
Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers
LAMBDA PHYSIK AG87 citations96
US6269110B1Jul 31, 2001
Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines
LAMBDA PHYSIK AG29 citations92
US6404795B1Jun 11, 2002
Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines
LAMBDA PHYSIK AG7 citations73
US6327284B1Dec 4, 2001
Detector with frequency converting coating
LAMBDA PHYSIK AG13 citations73
US6389048B2May 14, 2002
Detector with frequency converting coating
LAMBDA PHYSIK AG5 citations62