Inventor

FUJIWARA TOMOHARU

JP53 patents

⚠️ This page may combine multiple inventors who share the name “FUJIWARA TOMOHARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJIWARA TOMOHARU

NIKON CORP

Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus

Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same

Electrostatic wafer chucks and charged-particle-beam exposure apparatus comprising same

Exposure method and device manufacturing method

Plate member, substrate holding device, exposure apparatus and method, and device manufacturing method

Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrate

Maintenance method, maintenance device, exposure apparatus, and device manufacturing method

Wafer chucks and the like including substrate-adhesion detection and adhesion correction

Charged-particle-beam microlithography apparatus including selectable systems for determining alignment-mark position, and device-fabrication methods utilizing same

Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same

Reticle-substrate alignment methods for charged-particle-beam microlithography, and associated semiconductor-device manufacturing methods

Spatial light modulator, method of driving same, and exposure method and apparatus

Mark, method for forming same, and exposure apparatus

Mark forming method and device manufacturing method

Mark, method for forming same, and exposure apparatus

Mark forming method and device manufacturing method

Spatial light modulator, exposure apparatus, and method for manufacturing device

Image signal output device and method, and image data conversion device, method, and program

Image processing method, program, and image processing device

Mark, method for forming same, and exposure apparatus

Mark formation method and device manufacturing method

Exposure apparatus and exposure method, and device manufacturing method

Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same

Microlithographic exposure methods using a segmented reticle defining pattern elements exhibiting reduced incidence of stitching anomalies when imaged on a substrate

Image processing method, image processing program, image processing device, image display device, and image display method

Image signal output device and method, and image data conversion device, method, and program

Image processing method, image processing program, image processing device, image display device, and image display method

Image processing method, image processing device, and storage medium

Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid

Method and device for inspecting spatial light modulator, and exposure method and device

Spatial light modulator, exposure apparatus, and method for manufacturing device

Spatial light modulator, method of driving same, and exposure method and apparatus

Spatial light modulator, exposure apparatus, and method for manufacturing device

Exposure apparatus and device fabricating method

Maintenance method, maintenance device, exposure apparatus, and device manufacturing method

Exposure method, exposure apparatus, and device manufacturing method

FUJIWARA TOMOHARU

Method and device for inspecting spatial light modulator, and exposure method and device

Immersion exposure apparatus and device fabricating method with two substrate stages and metrology station

Maintenance method, maintenance device, exposure apparatus, and device manufacturing method

Immersion exposure apparatus and device manufacturing method with a liquid recovery port provided on at least one of a first stage and second stage

SHIRAISHI KENICHI

Exposure method, exposure apparatus, and device manufacturing method

Exposure method, exposure apparatus, and device manufacturing method

Exposure method, exposure apparatus, and device manufacturing method

Exposure method, exposure apparatus, and device manufacturing method

NAGASAKA HIROYUKI

Exposure apparatus, exposure method, and device manufacturing method

Exposure apparatus, exposure method, and device manufacturing method

OWA SOICHI

Spatial light modulator, exposure apparatus, and method for manufacturing device

WATANABE YOJI

Spatial light modulator, method of driving same, and exposure method and apparatus

NAKANO KATSUSHI

Immersion lithographic apparatus rinsing outer contour of substrate with immersion space

OPTOS PLC

Ocular image capturing device