Inventor
DIETZEL MARTIN
DE4 patents
Patents
4 patentsUS11061331B2Jul 13, 2021
Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth
ZEISS CARL SMT GMBH0 citations48
US10564551B2Feb 18, 2020
Method for determining a focus position of a lithography mask and metrology system for carrying out such a method
ZEISS CARL SMT GMBH0 citations48
US12288272B2Apr 29, 2025
Method for determining a production aerial image of an object to be measured
ZEISS CARL SMT GMBH0 citations45
US10481505B2Nov 19, 2019
Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks
ZEISS CARL SMT GMBH0 citations37