Inventor

SHAMALY JOHN

US2 patents

Patents

2 patents

US6977716B2Dec 20, 2005

Catadioptric lithography system and method with reticle stage orthogonal to wafer stage

ASML HOLDING NV2 citations59

US6757110B2Jun 29, 2004

Catadioptric lithography system and method with reticle stage orthogonal to wafer stage

ASML HOLDING NV4 citations59