Inventor

TEL WIM TJIBBO

NL68 patents

⚠️ This page may combine multiple inventors who share the name “TEL WIM TJIBBO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TEL WIM TJIBBO

ASML NETHERLANDS BV

Lithographic projection apparatus and a device manufacturing method

Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus

Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus

Computational metrology

Method of predicting patterning defects caused by overlay error

Method for determining a process window for a lithographic process, associated apparatuses and a computer program

Process window based on defect probability

Computational metrology

Method and system to monitor a process apparatus

Method of reducing a wave front aberration, and computer program product

Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus

Selection of measurement locations for patterning processes

Methods and apparatus for monitoring a lithographic manufacturing process

Selection of measurement locations for patterning processes

Metrology method for process window definition

Metrology target, method and apparatus, computer program and lithographic system

Computational metrology based sampling scheme

Method of manufacturing devices

Computational metrology based sampling scheme

Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product

Lithographic processing cell, lithographic apparatus, track and device manufacturing method

Method of determining control parameters of a device manufacturing process

Method of determining control parameters of a device manufacturing process

Computational metrology

Control based on probability density function of parameter

Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus

Method for determining defectiveness of pattern based on after development image

Computational metrology based correction and control

System and method for measurement of alignment

Computational metrology

Selection of measurement locations for patterning processes

Method and system to monitor a process apparatus

Separation of contributions to metrology data

Focus and overlay improvement by modifying a patterning device

Etch-assist features

Method of determining control parameters of a device manufacturing process

Method of wafer alignment using at resolution metrology on product features

Lithographic processing cell, lithographic apparatus, track and device manufacturing method

Computational metrology

Process window based on defect probability

Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method

Method for characterizing a manufacturing process of semiconductor devices

Method for calibrating a scanning charged particle microscope

Method for calibrating a scanning charged particle microscope

Lithographic process and apparatus and inspection process and apparatus

Method of determining a focus of a projection system, device manufacturing method, and apparatus for determining a focus of a projection system

Lithographic process and apparatus and inspection process and apparatus

Methods using fingerprint and evolution analysis

TEL WIM TJIBBO

Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product

KISTEMAN AREND JOHANNES

Method of determining focus corrections, lithographic processing cell and device manufacturing method