Inventor
CRAMER HUGO AUGUSTINUS JOSEPH
NL70 patents
⚠️ This page may combine multiple inventors who share the name “CRAMER HUGO AUGUSTINUS JOSEPH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
41 patentsUS7112813B2Sep 26, 2006
Device inspection method and apparatus using an asymmetric marker
ASML NETHERLANDS BV61 citations96
US6809797B2Oct 26, 2004
Lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV71 citations94
US7916284B2Mar 29, 2011
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
ASML NETHERLANDS BV23 citations93
US7460237B1Dec 2, 2008
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
ASML NETHERLANDS BV36 citations93
US10615084B2Apr 7, 2020
Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
ASML NETHERLANDS BV9 citations92
US10546790B2Jan 28, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV7 citations92
US10453758B2Oct 22, 2019
Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion
ASML NETHERLANDS BV9 citations92
US8994944B2Mar 31, 2015
Methods and scatterometers, lithographic systems, and lithographic processing cells
ASML NETHERLANDS BV24 citations92
US12142535B2Nov 12, 2024
Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry
ASML NETHERLANDS BV2 citations84
US11784098B2Oct 10, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV3 citations84
US11145557B2Oct 12, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV5 citations84
US11101184B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV2 citations84
US9128065B2Sep 8, 2015
Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method
ASML NETHERLANDS BV5 citations84
US10811323B2Oct 20, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV4 citations82
US10488768B2Nov 26, 2019
Beat patterns for alignment on small metrology targets
ASML NETHERLANDS BV10 citations82
US7738103B2Jun 15, 2010
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a parameter of a target pattern
ASML NETHERLANDS BV9 citations79
US7916927B2Mar 29, 2011
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
ASML NETHERLANDS BV11 citations77
US12007697B2Jun 11, 2024
Method for process metrology
ASML NETHERLANDS BV4 citations73
US10845713B2Nov 24, 2020
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV2 citations73
US10481503B2Nov 19, 2019
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV2 citations73
US10180628B2Jan 15, 2019
Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method
ASML NETHERLANDS BV4 citations73
US9952517B2Apr 24, 2018
Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing method
ASML NETHERLANDS BV6 citations73
US11940739B2Mar 26, 2024
Metrology apparatus
ASML NETHERLANDS BV1 citations72
US11385551B2Jul 12, 2022
Method for process metrology
ASML NETHERLANDS BV2 citations72
US11262661B2Mar 1, 2022
Metrology apparatus
ASML NETHERLANDS BV4 citations72
US11009343B2May 18, 2021
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
ASML NETHERLANDS BV2 citations72
US10132763B2Nov 20, 2018
Inspection method and apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations72
US10983445B2Apr 20, 2021
Method and apparatus for measuring a parameter of interest using image plane detection techniques
ASML NETHERLANDS BV3 citations71
US10627213B2Apr 21, 2020
Statistical hierarchical reconstruction from metrology data
ASML NETHERLANDS BV2 citations71
US9436099B2Sep 6, 2016
Lithographic focus and dose measurement using a 2-D target
ASML NETHERLANDS BV5 citations71
US10317805B2Jun 11, 2019
Method for monitoring a characteristic of illumination from a metrology apparatus
ASML NETHERLANDS BV2 citations68
US9964853B2May 8, 2018
Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method
ASML NETHERLANDS BV6 citations68
US10955756B2Mar 23, 2021
Method of measuring a target, metrology apparatus, lithographic cell, and target
ASML NETHERLANDS BV1 citations63
US12591179B2Mar 31, 2026
Metrology apparatus
ASML NETHERLANDS BV0 citations62
US12566406B2Mar 3, 2026
Dark field digital holographic microscope and associated metrology method
ASML NETHERLANDS BV0 citations62
US12322660B2Jun 3, 2025
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11728224B2Aug 15, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11650047B2May 16, 2023
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
ASML NETHERLANDS BV0 citations62
US11520239B2Dec 6, 2022
Separation of contributions to metrology data
ASML NETHERLANDS BV1 citations62
US11101185B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11092900B2Aug 17, 2021
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV0 citations62
DEN BOEF ARIE JEFFREY
4 patentsUS8868387B2Oct 21, 2014
Method of optimizing a model, a method of measuring a property, a device manufacturing method, a spectrometer and a lithographic apparatus
DEN BOEF ARIE JEFFREY28 citations89
US8830472B2Sep 9, 2014
Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus
DEN BOEF ARIE JEFFREY8 citations84
US8830447B2Sep 9, 2014
Inspection method for lithography
DEN BOEF ARIE JEFFREY10 citations84
US8189195B2May 29, 2012
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
DEN BOEF ARIE JEFFREY15 citations84
CRAMER HUGO AUGUSTINUS JOSEPH
3 patentsUS9081303B2Jul 14, 2015
Methods and scatterometers, lithographic systems, and lithographic processing cells
CRAMER HUGO AUGUSTINUS JOSEPH73 citations96
US8705007B2Apr 22, 2014
Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method
CRAMER HUGO AUGUSTINUS JOSEPH26 citations92
US9182682B2Nov 10, 2015
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
CRAMER HUGO AUGUSTINUS JOSEPH9 citations84
LEEWIS CHRISTIAN MARINUS
1 patentABEN MARIA JOHANNA HENDRIKA
1 patentShowing the top 50 of 70 patents by PatentIndex Score.