Inventor
THEEUWES THOMAS
NL34 patents
⚠️ This page may combine multiple inventors who share the name “THEEUWES THOMAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
32 patentsUS10615084B2Apr 7, 2020
Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
ASML NETHERLANDS BV9 citations92
US10546790B2Jan 28, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV7 citations92
US10453758B2Oct 22, 2019
Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion
ASML NETHERLANDS BV9 citations92
US12142535B2Nov 12, 2024
Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry
ASML NETHERLANDS BV2 citations84
US11784098B2Oct 10, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV3 citations84
US11145557B2Oct 12, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV5 citations84
US11101184B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV2 citations84
US10811323B2Oct 20, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV4 citations82
US12007697B2Jun 11, 2024
Method for process metrology
ASML NETHERLANDS BV4 citations73
US10845713B2Nov 24, 2020
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV2 citations73
US10481503B2Nov 19, 2019
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV2 citations73
US11385551B2Jul 12, 2022
Method for process metrology
ASML NETHERLANDS BV2 citations72
US11947269B2Apr 2, 2024
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV2 citations71
US11143972B2Oct 12, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV1 citations71
US10816904B2Oct 27, 2020
Method for determining contribution to a fingerprint
ASML NETHERLANDS BV2 citations70
US12322660B2Jun 3, 2025
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11728224B2Aug 15, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11520239B2Dec 6, 2022
Separation of contributions to metrology data
ASML NETHERLANDS BV1 citations62
US11101185B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11092900B2Aug 17, 2021
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV0 citations62
US10677589B2Jun 9, 2020
Substrate, metrology apparatus and associated methods for a lithographic process
ASML NETHERLANDS BV1 citations62
US11710668B2Jul 25, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations61
US12468235B2Nov 11, 2025
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations60
US11314174B2Apr 26, 2022
Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
ASML NETHERLANDS BV1 citations60
US11378891B2Jul 5, 2022
Method for determining contribution to a fingerprint
ASML NETHERLANDS BV1 citations59
US11137695B2Oct 5, 2021
Method of determining a height profile, a measurement system and a computer readable medium
ASML NETHERLANDS BV1 citations58
US11733606B2Aug 22, 2023
Method for performing a manufacturing process and associated apparatuses
ASML NETHERLANDS BV1 citations56
US10871367B2Dec 22, 2020
Substrate, metrology apparatus and associated methods for a lithographic process
ASML NETHERLANDS BV0 citations51
US9360770B2Jun 7, 2016
Method of determining focus corrections, lithographic processing cell and device manufacturing method
ASML NETHERLANDS BV0 citations49
US9927717B2Mar 27, 2018
Inspection method and apparatus, and lithographic apparatus
ASML NETHERLANDS BV1 citations47
US12510828B2Dec 30, 2025
Method for controlling a manufacturing process and associated apparatuses
ASML NETHERLANDS BV0 citations44
US10429746B2Oct 1, 2019
Estimation of data in metrology
ASML NETHERLANDS BV0 citations37