Inventor

HINNEN PAUL CHRISTIAAN

NL53 patents

⚠️ This page may combine multiple inventors who share the name “HINNEN PAUL CHRISTIAAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HINNEN PAUL CHRISTIAAN

ASML NETHERLANDS BV

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion

Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method for determining a process window for a lithographic process, associated apparatuses and a computer program

Method and system to monitor a process apparatus

Method and apparatus to determine a patterning process parameter

Beat patterns for alignment on small metrology targets

Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method

Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

Metrology method, patterning device, apparatus and computer program

Metrology method, patterning device, apparatus and computer program

Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method

Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus for measuring a parameter of interest using image plane detection techniques

Alignment systems and methods for lithographic systems

Inspection method, lithographic apparatus, mask and substrate

Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method

Lithographic apparatus and device manufacturing method

Method and apparatus to determine a patterning process parameter

Method and system to monitor a process apparatus

Method and apparatus to determine a patterning process parameter

Separation of contributions to metrology data

Method and apparatus to determine a patterning process parameter

Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method

Metrology method and apparatus with increased bandwidth

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

Inspection method, lithographic apparatus, mask and substrate

Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets

Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets

Metrology method and apparatus with increased bandwidth

Inspection apparatus, inspection method, lithographic apparatus and manufacturing method

Method of controlling a patterning process, device manufacturing method

Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method

VAN BILSEN FRANCISCUS BERNARDUS MARIA

Alignment systems and methods for lithographic systems

CRAMER HUGO AUGUSTINUS JOSEPH

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

DEN BOEF ARIE JEFFREY

Inspection method for lithography