Inventor

HUANG CHUNCHIEH

CN25 patents

⚠️ This page may combine multiple inventors who share the name “HUANG CHUNCHIEH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HUANG CHUNCHIEH

ORDOS YUANSHENG OPTOELECTRONICS CO LTD

Mask device and manufacturing method thereof, evaporation system

Printing mask and method of printing adhesive pattern

Blade inspection device and method and printing modification device

Mask frame and method for manufacturing the same, mask assembly for evaporation and evaporation apparatus

Mask sheet and method for manufacturing the same

Method and apparatus for calculating equivalent mechanical parameters of film layer etching region

Device for inspecting mask plate, method for inspecting mask plate, and corresponding method for controlling light sources

PROMOS TECHNOLOGIES INC

Method of forming ONO-type sidewall with reduced bird&#39;s beak

Substrate isolation in integrated circuits

Substrate isolation in integrated circuits

Precision creation of inter-gates insulator

Use of multiple etching steps to reduce lateral etch undercut

Use of pedestals to fabricate contact openings

BOE TECHNOLOGY GROUP CO LTD

Mask plate and method for fabricating the same

Mask assembly with support bar configured to support back plate, installation thereof and evaporation apparatus

Metal mask, metal mask plate and method of manufacturing the same

Cement sintering device and cement sintering method

Mask plate frame, mask plate and evaporation apparatus

EVERDISPLAY OPTRONICS SHANGHAI LTD

Method for measuring offset of sub-pixel in OLED manufacturing process

Organic light emitting structure

Thin film transistor and manufacturing method thereof and display comprising the same

INVENSENSE INC

Device and method for sensor calibration

Method and system for MEMS devices with dual damascene formed electrodes

MOSEL VITELIC INC

Sidewall protection in fabrication of integrated circuits

AGERE SYSTEMS INC

Bipolar transistor with a low K material in emitter base spacer regions

Method of forming ONO-type sidewall with reduced bird's beak