P

Inventor

MASUDA TAKAO

JP77 patents
⚠️ This page may combine multiple inventors who share the name “MASUDA TAKAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJI PHOTO FILM CO LTD

37 patents
US4359524ANov 16, 1982

Heat developable photosensitive material

FUJI PHOTO FILM CO LTD68 citations96
US4021249AMay 3, 1977

Heat developable light-sensitive material incorporating a substituted s-triazine-2,4,6-(1H, 3H, 5H)-trione reducing agent

FUJI PHOTO FILM CO LTD38 citations92
US4152160AMay 1, 1979

Thermally developable light-sensitive material with a benzoic acid

FUJI PHOTO FILM CO LTD33 citations89
US3933508AJan 20, 1976

Heat developable light-sensitive materials

FUJI PHOTO FILM CO LTD34 citations89
US4258129AMar 24, 1981

Thermally developable light sensitive material using trivalent and tetravalent cerium compounds

FUJI PHOTO FILM CO LTD20 citations82
US4170480AOct 9, 1979

Thermally developable light-sensitive material

FUJI PHOTO FILM CO LTD28 citations82
US4076539AFeb 28, 1978

Process for preparing silver halide dispersions

FUJI PHOTO FILM CO LTD23 citations82
US4021250AMay 3, 1977

Thermally developable photosensitive material

FUJI PHOTO FILM CO LTD21 citations82
US4307187ADec 22, 1981

Thermally developable light-sensitive materials

FUJI PHOTO FILM CO LTD14 citations74
US4213784AJul 22, 1980

Process for producing heat developable light-sensitive compositions and elements

FUJI PHOTO FILM CO LTD13 citations74
US4211839AJul 8, 1980

Method of producing light-sensitive composition for use in thermally developable light-sensitive elements and elements so produced

FUJI PHOTO FILM CO LTD18 citations74
US4157289AJun 5, 1979

Process for preparing slightly soluble silver salt grains

FUJI PHOTO FILM CO LTD12 citations74
US4152162AMay 1, 1979

Thermally developable light-sensitive materials

FUJI PHOTO FILM CO LTD7 citations74
US4144072AMar 13, 1979

Thermally developable light-sensitive material

FUJI PHOTO FILM CO LTD18 citations74
US4128428ADec 5, 1978

Heat developable light-sensitive material

FUJI PHOTO FILM CO LTD9 citations74
US4120728AOct 17, 1978

Thermally developable light-sensitive material

FUJI PHOTO FILM CO LTD14 citations74
US4030931AJun 21, 1977

Heat developable light-sensitive material

FUJI PHOTO FILM CO LTD11 citations74
US4009039AFeb 22, 1977

Heat developable light-sensitive oxazoline containing element

FUJI PHOTO FILM CO LTD16 citations74
US4003749AJan 18, 1977

Heat-developable light-sensitive materials using the reaction product of a organic silver salt an a N-halo-oxazolidinone

FUJI PHOTO FILM CO LTD14 citations74
US4002479AJan 11, 1977

2-Thiouracil in heat-developable light-sensitive materials

FUJI PHOTO FILM CO LTD16 citations74
US3997346ADec 14, 1976

Method for stabilizing the image of a thermally developable photosensitive material

FUJI PHOTO FILM CO LTD13 citations74
US3960908AJun 1, 1976

Process for preparing organosilver carboxylates

FUJI PHOTO FILM CO LTD10 citations74
US3957493AMay 18, 1976

Thermodevelopable photographic material with N-haloacetamide

FUJI PHOTO FILM CO LTD10 citations74
US3957517AMay 18, 1976

Dry stabilization of a silver halide photographic material

FUJI PHOTO FILM CO LTD7 citations74
US4076534AFeb 28, 1978

Heat developable light-sensitive material

FUJI PHOTO FILM CO LTD10 citations73
US4030930AJun 21, 1977

Heat-developable light-sensitive material

FUJI PHOTO FILM CO LTD7 citations73
US4207112AJun 10, 1980

Heat developable light-sensitive materials

FUJI PHOTO FILM CO LTD11 citations71
US4376162AMar 8, 1983

Heat-developable photosensitive material with antihalation layer

FUJI PHOTO FILM CO LTD13 citations70
US4267267AMay 12, 1981

Thermally-developable light-sensitive elements

FUJI PHOTO FILM CO LTD6 citations63
US4237215ADec 2, 1980

Heat-developable light-sensitive material

FUJI PHOTO FILM CO LTD5 citations63
US4193804AMar 18, 1980

Process for preparing a composition for a thermally developable light-sensitive material

FUJI PHOTO FILM CO LTD4 citations63
US4181530AJan 1, 1980

Thermally developable light-sensitive material having reduced fog

FUJI PHOTO FILM CO LTD3 citations63
US4156611AMay 29, 1979

Heat-developable photosensitive materials

FUJI PHOTO FILM CO LTD3 citations63
US4140532AFeb 20, 1979

Thermally developable light-sensitive material

FUJI PHOTO FILM CO LTD5 citations63
US4125403ANov 14, 1978

Heat developable light sensitive material

FUJI PHOTO FILM CO LTD4 citations63
US4055432AOct 25, 1977

Thermodevelopable photographic material

FUJI PHOTO FILM CO LTD5 citations63
US4028129AJun 7, 1977

Heat-developable photosensitive materials

FUJI PHOTO FILM CO LTD4 citations63

FURUKAWA ELECTRIC CO LTD

6 patents

UNIV HOKKAIDO NAT UNIV CORP

4 patents

HASHIMOTO KENJI

1 patent

NGK INSULATORS LTD

1 patent

MITSUBISHI PAPER MILLS LTD

1 patent

Showing the top 50 of 77 patents by PatentIndex Score.