P

Inventor

AVIRAM ARI

40 patents
⚠️ This page may combine multiple inventors who share the name “AVIRAM ARI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

37 patents
US6420088B1Jul 16, 2002

Antireflective silicon-containing compositions as hardmask layer

IBM214 citations98
US6503692B2Jan 7, 2003

Antireflective silicon-containing compositions as hardmask layer

IBM85 citations97
US6420084B1Jul 16, 2002

Mask-making using resist having SIO bond-containing polymer

IBM83 citations97
US4549824AOct 29, 1985

Ink additives for efficient thermal ink transfer printing processes

IBM66 citations96
US6653045B2Nov 25, 2003

Radiation sensitive silicon-containing negative resists and use thereof

IBM15 citations92
US6436605B1Aug 20, 2002

Plasma resistant composition and use thereof

IBM31 citations92
US6197896B1Mar 6, 2001

Graft polymers and use thereof

IBM45 citations92
US6171757B1Jan 9, 2001

Organometallic polymers and use thereof

IBM26 citations92
US4440801AApr 3, 1984

Method for depositing a metal layer on polyesters

IBM32 citations90
US4413266ANov 1, 1983

Method and apparatus for erasing ink jet printing

IBM44 citations89
US6348299B1Feb 19, 2002

RIE etch resistant nonchemically amplified resist composition and use thereof

IBM14 citations83
US4491432AJan 1, 1985

Chemical heat amplification in thermal transfer printing

IBM24 citations81
US4268368AMay 19, 1981

Electrophoretical method for selectively reinking resistive ribbon thermal transfer printing ribbons

IBM20 citations81
US6280908B1Aug 28, 2001

Post-development resist hardening by vapor silylation

IBM17 citations80
US4525722AJun 25, 1985

Chemical heat amplification in thermal transfer printing

IBM25 citations79
US4400100AAug 23, 1983

Four layered ribbon for electrothermal printing

IBM20 citations76
US6821718B2Nov 23, 2004

Radiation sensitive silicon-containing negative resists and use thereof

IBM10 citations74
US6689540B2Feb 10, 2004

Polymers and use thereof

IBM7 citations74
US6458907B1Oct 1, 2002

Organometallic polymers and use thereof

IBM10 citations74
US4568621AFeb 4, 1986

Thermal transfer printing processes with electroerosion and materials therefor

IBM7 citations74
US6280901B1Aug 28, 2001

High sensitivity, photo-active polymer and developers for high resolution resist applications

IBM8 citations73
US5955242ASep 21, 1999

High sensitivity, photo-active polymer and developers for high resolution resist applications

IBM7 citations73
US4491431AJan 1, 1985

Metal-insulator resistive ribbon for thermal transfer printing

IBM10 citations73
US4470714ASep 11, 1984

Metal-semiconductor resistive ribbon for thermal transfer printing and method for using

IBM14 citations73
US4609926ASep 2, 1986

Ribbon transfer color-on-demand resistive ribbon printing

IBM3 citations63
US4538252AAug 27, 1985

Light induced capacitance changes in donor polymers (or small molecules) films and its use for information storage in video disks and the like

IBM5 citations63
US4247622AJan 27, 1981

Photodeformable polymeric compositions

IBM3 citations63
US6100011AAug 8, 2000

High sensitivity, photo-active polymer and developers for high resolution resist applications

IBM1 citations62
US5908732AJun 1, 1999

Polymer compositions for high resolution resist applications

IBM5 citations62
US4692044ASep 8, 1987

Interface resistance and knee voltage enhancement in resistive ribbon printing

IBM3 citations62
US4577983AMar 25, 1986

Color-on-demand ribbon printing

IBM3 citations62
US5567569AOct 22, 1996

Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring

IBM4 citations61
US5552256ASep 3, 1996

Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring

IBM2 citations61
US6346362B1Feb 12, 2002

Polymers and use thereof

IBM0 citations52
US5972571AOct 26, 1999

Negative resist composition and use thereof

IBM1 citations52
US4297434AOct 27, 1981

Photodeformable article having photoionizable groups on a polymer backbone

IBM1 citations52
US5644038AJul 1, 1997

Quinone diazo compound containing non-metallic atom

IBM0 citations47

AVIRAM ARI

3 patents