Inventor

SHIMASE AKIRA

JP52 patents

⚠️ This page may combine multiple inventors who share the name “SHIMASE AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIMASE AKIRA

HITACHI LTD

Multilayered device micro etching method and system

Method of making wiring and logic corrections on a semiconductor device by use of focused ion beams

Method for making specimen and apparatus thereof

Method and apparatus for inspecting or measuring a sample based on charged-particle beam imaging, and a charged-particle beam apparatus

Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beam

Processing method and apparatus using focused ion beam generating means

Processing method and apparatus using focused energy beam

Pattern forming method using charged particle beam process and charged particle beam processing system

Process method and apparatus using focused ion beam generating means

Process method and apparatus using focused ion beam generating means

Phase shift mask, method of correcting the same and apparatus for carrying out the method

Ion beam processing method and apparatus

Method of etching a semiconductor device by an ion beam

Semiconductor integrated circuit device and process for producing the same

IC wiring connecting method and resulting article

Method and apparatus for forming film by ion beam

Method and apparatus for correcting delicate wiring of IC device

Ion beam processing apparatus and method of correcting mask defects

Sample processing apparatus and method for removing charge on sample through light irradiation

Method and apparatus for observing or processing and analyzing using a charged beam

Method and system for judging milling end point for use in charged particle beam milling system

IC wiring connecting method and apparatus

Method of processing a sample using a charged beam and reactive gases and system employing the same

Optical mask and method of correcting the same

Apparatus for processing a sample using a charged beam and reactive gases

Combination apparatus having a scanning electron microscope therein

Method of providing a semiconductor IC device with an additional conduction path

Method and apparatus for correcting defects of X-ray mask

Method of correcting defect in circuit pattern

Apparatus for ion beam work

Apparatus for summing several ring-shape laser beams

IC wiring connecting method and apparatus

Pattern forming method using charged particle beam process and charged particle beam processing system

IC wiring connecting method using focused energy beams

Liquid metal ion source

Apparatus for irradiation with charged particle beams

Probe driving method, and probe apparatus

Ion source

HAMAMATSU PHOTONICS KK

Semiconductor device inspection apparatus and semiconductor device inspection method

Inspection method, inspection device, and marking forming method

Optical measurement method, optical measurement device, optical measurement program, and recording medium for recording optical measurement program

Inspection method, inspection device, and marking forming method

Semiconductor failure analysis apparatus which acquires a failure observed image, failure analysis method, and failure analysis program

Semiconductor failure analysis apparatus, failure analysis method, and failure analysis program

Semiconductor inspecting method and semiconductor inspecting device

Analysis method, analysis device, analysis program, and recording medium for recording analysis program

Wafer conveyance unit and wafer conveyance method

RENESAS TECH CORP

Manufacturing method of semiconductor integrated circuit device and probe card

Manufacturing method of semiconductor integrated circuit device and probe card

HITACHI ULSI SYS CO LTD

Probe driving method, and probe apparatus