P

Inventor

MAKINO DAISUKE

JP48 patents
⚠️ This page may combine multiple inventors who share the name “MAKINO DAISUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI CHEMICAL CO LTD

14 patents
US4698291AOct 6, 1987

Photosensitive composition with 4-azido-2'-methoxychalcone

HITACHI CHEMICAL CO LTD61 citations95
US4758476AJul 19, 1988

Polyimide precursor resin composition and semiconductor device using the same

HITACHI CHEMICAL CO LTD28 citations91
US4735492AApr 5, 1988

Liquid crystal orientation controlling film and liquid crystal device using the same

HITACHI CHEMICAL CO LTD25 citations91
US4485234ANov 27, 1984

Method of preparing polyamide acid for processing of semiconductors

HITACHI CHEMICAL CO LTD8 citations74
US4447596AMay 8, 1984

Method of preparing polyamide acid for processing of semiconductors

HITACHI CHEMICAL CO LTD11 citations74
US4338427AJul 6, 1982

Process for producing polyimide-amide-carboxylic acid

HITACHI CHEMICAL CO LTD15 citations74
US4225702ASep 30, 1980

Method of preparing polyamide acid type intermediates for processing of semiconductors

HITACHI CHEMICAL CO LTD12 citations74
US4645688AFeb 24, 1987

Composition for protective coating material

HITACHI CHEMICAL CO LTD9 citations73
US4511705AApr 16, 1985

Composition for protective coating material

HITACHI CHEMICAL CO LTD10 citations73
US4497922AFeb 5, 1985

Compositions of materials for forming protective film in semiconductor device

HITACHI CHEMICAL CO LTD7 citations73
US4338426AJul 6, 1982

Intermediate, copolymer resin and production thereof

HITACHI CHEMICAL CO LTD10 citations73
US4847358AJul 11, 1989

Process for producing polyamide acid having siloxane bonds and polyimide having siloxane bonds and isoindoloquinazolinedione rings

HITACHI CHEMICAL CO LTD8 citations70
US4513077AApr 23, 1985

Electron beam or X-ray reactive image-formable resinous composition

HITACHI CHEMICAL CO LTD5 citations63
US4801519AJan 31, 1989

Process for producing a pattern with negative-type photosensitive composition

HITACHI CHEMICAL CO LTD6 citations62

NIPPON SOKEN

9 patents

DENSO CORP

7 patents

HITACHI LTD

5 patents

NIPPON DENSO CO

4 patents

TEIKOKU TSUSHIN KOGYO KK

2 patents

CEMEDINE CO LTD

2 patents

CANON KK

2 patents

(unassigned)

1 patent

NTT COMM CORP

1 patent

MAKINO DAISUKE

1 patent