Inventor
HONDA MASANOBU
JP118 patents
⚠️ This page may combine multiple inventors who share the name “HONDA MASANOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
30 patentsUS10090191B2Oct 2, 2018
Selective plasma etching method of a first region containing a silicon atom and an oxygen atom
TOKYO ELECTRON LTD39 citations94
US9972503B2May 15, 2018
Etching method
TOKYO ELECTRON LTD40 citations94
US9837285B2Dec 5, 2017
Etching method
TOKYO ELECTRON LTD40 citations94
US7749914B2Jul 6, 2010
Plasma etching method
TOKYO ELECTRON LTD39 citations93
US7625494B2Dec 1, 2009
Plasma etching method and plasma etching unit
TOKYO ELECTRON LTD35 citations92
US7338576B2Mar 4, 2008
Plasma processing device
TOKYO ELECTRON LTD41 citations92
US7895970B2Mar 1, 2011
Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component
TOKYO ELECTRON LTD18 citations84
US7883632B2Feb 8, 2011
Plasma processing method
TOKYO ELECTRON LTD8 citations84
US7473377B2Jan 6, 2009
Plasma processing method
TOKYO ELECTRON LTD14 citations80
US11101138B2Aug 24, 2021
Etching method
TOKYO ELECTRON LTD3 citations73
US10504745B2Dec 10, 2019
Method for processing target object
TOKYO ELECTRON LTD2 citations73
US9607811B2Mar 28, 2017
Workpiece processing method
TOKYO ELECTRON LTD4 citations73
US9390935B2Jul 12, 2016
Etching method
TOKYO ELECTRON LTD5 citations73
US9299579B2Mar 29, 2016
Etching method and plasma processing apparatus
TOKYO ELECTRON LTD3 citations73
US11699614B2Jul 11, 2023
Film deposition method and plasma processing apparatus
TOKYO ELECTRON LTD2 citations72
US11651971B2May 16, 2023
Etching method, substrate processing apparatus, and substrate processing system
TOKYO ELECTRON LTD2 citations72
US10651044B2May 12, 2020
Processing method and plasma processing apparatus
TOKYO ELECTRON LTD2 citations72
US9330973B2May 3, 2016
Workpiece processing method
TOKYO ELECTRON LTD4 citations72
US9396962B2Jul 19, 2016
Etching method
TOKYO ELECTRON LTD3 citations71
US9202707B2Dec 1, 2015
Semiconductor device manufacturing method
TOKYO ELECTRON LTD5 citations71
US9735027B2Aug 15, 2017
Method for etching organic film
TOKYO ELECTRON LTD3 citations70
US7794616B2Sep 14, 2010
Etching gas, etching method and etching gas evaluation method
TOKYO ELECTRON LTD5 citations63
US7419613B2Sep 2, 2008
Method and device for plasma-etching organic material film
TOKYO ELECTRON LTD5 citations63
US12532681B2Jan 20, 2026
Etching method and plasma processing system
TOKYO ELECTRON LTD0 citations62
US12476115B2Nov 18, 2025
Method for processing workpiece
TOKYO ELECTRON LTD0 citations62
US12412750B2Sep 9, 2025
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US12334343B2Jun 17, 2025
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD0 citations62
US12071687B2Aug 27, 2024
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11955337B2Apr 9, 2024
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD0 citations62
US11594422B2Feb 28, 2023
Film etching method for etching film
TOKYO ELECTRON LTD0 citations62
HONDA MASANOBU
10 patentsUS8524331B2Sep 3, 2013
Substrate processing method
HONDA MASANOBU35 citations94
US8642483B2Feb 4, 2014
Substrate processing with shrink etching step
HONDA MASANOBU15 citations84
US8545671B2Oct 1, 2013
Plasma processing method and plasma processing apparatus
HONDA MASANOBU7 citations84
US8440572B2May 14, 2013
Si etching method
HONDA MASANOBU7 citations84
US8790489B2Jul 29, 2014
Substrate processing apparatus and substrate processing method
HONDA MASANOBU17 citations83
US8105949B2Jan 31, 2012
Substrate processing method
HONDA MASANOBU10 citations82
US8303834B2Nov 6, 2012
Plasma processing apparatus and plasma etching method
HONDA MASANOBU6 citations72
US8241514B2Aug 14, 2012
Plasma etching method and computer readable storage medium
HONDA MASANOBU5 citations63
US8157952B2Apr 17, 2012
Plasma processing chamber, potential controlling apparatus, potential controlling method, program for implementing the method, and storage medium storing the program
HONDA MASANOBU2 citations63
US8057603B2Nov 15, 2011
Method of cleaning substrate processing chamber, storage medium, and substrate processing chamber
HONDA MASANOBU2 citations63
MATSUSHITA ELECTRONICS CORP
3 patentsUS5079486AJan 7, 1992
Deflection yoke for color crt
MATSUSHITA ELECTRONICS CORP10 citations69
US6008574ADec 28, 1999
Deflection yoke providing improved image quality
MATSUSHITA ELECTRONICS CORP3 citations63
US5859495AJan 12, 1999
Deflection yoke and color cathode ray tube comprising the deflection yoke
MATSUSHITA ELECTRONICS CORP4 citations63
KAWAMATA MASAYA
2 patentsHITACHI LTD
2 patentsSATO MANABU
1 patentYAMAZAWA YOHEI
1 patentKOSHIMIZU CHISHIO
1 patentShowing the top 50 of 118 patents by PatentIndex Score.