Inventor
TSENG MENG CHU
US6 patents
Patents
6 patentsUS5817576AOct 6, 1998
Utilization of SiH4 soak and purge in deposition processes
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US5643633AJul 1, 1997
Uniform tungsten silicide films produced by chemical vapor depostiton
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US5997950ADec 7, 1999
Substrate having uniform tungsten silicide film and method of manufacture
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US5780360AJul 14, 1998
Purge in silicide deposition processes dichlorosilane
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US10847463B2Nov 24, 2020
Seed layers for copper interconnects
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US6193813B1Feb 27, 2001
Utilization of SiH4 soak and purge in deposition processes
APPLIED MATERIALS INC3 citations61