P

Inventor

MCDONALD STEVEN M

US33 patents
⚠️ This page may combine multiple inventors who share the name “MCDONALD STEVEN M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

32 patents
US6169021B1Jan 2, 2001

Method of making a metallized recess in a substrate

MICRON TECHNOLOGY INC253 citations99
US6046094AApr 4, 2000

Method of forming wafer alignment patterns

MICRON TECHNOLOGY INC105 citations99
US7603772B2Oct 20, 2009

Methods of fabricating substrates including one or more conductive vias

MICRON TECHNOLOGY INC41 citations96
US6884642B2Apr 26, 2005

Wafer-level testing apparatus and method

MICRON TECHNOLOGY INC38 citations96
US6174590B1Jan 16, 2001

Isolation using an antireflective coating

MICRON TECHNOLOGY INC37 citations96
US6121133ASep 19, 2000

Isolation using an antireflective coating

MICRON TECHNOLOGY INC57 citations96
US5700732ADec 23, 1997

Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns

MICRON TECHNOLOGY INC37 citations96
US7316063B2Jan 8, 2008

Methods of fabricating substrates including at least one conductive via

MICRON TECHNOLOGY INC21 citations93
US6744067B1Jun 1, 2004

Wafer-level testing apparatus and method

MICRON TECHNOLOGY INC34 citations93
US6495450B1Dec 17, 2002

Isolation using an antireflective coating

MICRON TECHNOLOGY INC17 citations93
US6423631B1Jul 23, 2002

Isolation using an antireflective coating

MICRON TECHNOLOGY INC14 citations93
US7030010B2Apr 18, 2006

Methods for creating electrophoretically insulated vias in semiconductive substrates and resulting structures

MICRON TECHNOLOGY INC12 citations92
US5925937AJul 20, 1999

Semiconductor wafer, wafer alignment patterns

MICRON TECHNOLOGY INC23 citations92
US7329899B2Feb 12, 2008

Wafer-level redistribution circuit

MICRON TECHNOLOGY INC9 citations84
US6137186AOct 24, 2000

Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns

MICRON TECHNOLOGY INC10 citations82
US7594322B2Sep 29, 2009

Methods of fabricating substrates including at least one conductive via

MICRON TECHNOLOGY INC6 citations74
US7105437B2Sep 12, 2006

Methods for creating electrophoretically insulated vias in semiconductive substrates

MICRON TECHNOLOGY INC4 citations74
US7105921B2Sep 12, 2006

Semiconductor assemblies having electrophoretically insulated vias

MICRON TECHNOLOGY INC4 citations74
US6635396B2Oct 21, 2003

Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication

MICRON TECHNOLOGY INC5 citations74
US6605502B2Aug 12, 2003

Isolation using an antireflective coating

MICRON TECHNOLOGY INC10 citations74
US6455212B1Sep 24, 2002

Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication

MICRON TECHNOLOGY INC10 citations74
US6313650B1Nov 6, 2001

Insert testing system

MICRON TECHNOLOGY INC10 citations74
US6248429B1Jun 19, 2001

Metallized recess in a substrate

MICRON TECHNOLOGY INC12 citations74
US6207529B1Mar 27, 2001

Semiconductor wafer,wafer alignment patterns and method of forming wafer alignment patterns

MICRON TECHNOLOGY INC5 citations74
US5798292AAug 25, 1998

Method of forming wafer alignment patterns

MICRON TECHNOLOGY INC7 citations74
US7498670B2Mar 3, 2009

Semiconductor structures having electrophoretically insulated vias

MICRON TECHNOLOGY INC2 citations63
US7470590B2Dec 30, 2008

Methods of forming semiconductor constructions

MICRON TECHNOLOGY INC5 citations63
US7115512B2Oct 3, 2006

Methods of forming semiconductor constructions

MICRON TECHNOLOGY INC2 citations63
US6777144B2Aug 17, 2004

Method for patterning a photoresist material for semiconductor component fabrication

MICRON TECHNOLOGY INC2 citations63
US6573013B2Jun 3, 2003

Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication

MICRON TECHNOLOGY INC2 citations63
US6482572B1Nov 19, 2002

Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication

MICRON TECHNOLOGY INC3 citations63
US7335981B2Feb 26, 2008

Methods for creating electrophoretically insulated vias in semiconductive substrates

MICRON TECHNOLOGY INC0 citations52

(unassigned)

1 patent