Inventor

HANABATA MAKOTO

JP20 patents

⚠️ This page may combine multiple inventors who share the name “HANABATA MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HANABATA MAKOTO

SUMITOMO CHEMICAL CO

Novolak resin for positive photoresist

Process for producing an aromatic polyester composition

Plastic container improved in barrier properties against gases and water vapor

Positive type high gamma-value photoresist composition with novolak resin possessing

Positive photoresist composition with m-hydroxy-α-methylstyrene homopolymer and quinonediazide compound

Process for producing aromatic polyester

Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound

Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester

Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound

Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition

Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin

KANSAI RES INST INC

Photosensitive resin composition and process for forming pattern

Active particle, photosensitive resin composition, and process for forming pattern

KANSAI RES INST

Piezoelectric thin film device, its production method, and ink-jet recording head

Inorganic-containing photosensitive resin composition and method for forming inorganic pattern

OSAKA GAS CO LTD

Optically active compound and photosensitive resin composition

KRI INC

Active components and photosensitive resin composition containing the same

NISSAN CHEMICAL IND LTD

Three-dimensional pattern forming material