Inventor
WALLS JOHN E
US59 patents
⚠️ This page may combine multiple inventors who share the name “WALLS JOHN E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST CO AMERICAN
29 patentsUS4383897AMay 17, 1983
Electrochemically treated metal plates
HOECHST CO AMERICAN60 citations96
US4502925AMar 5, 1985
Process for aluminum surface preparation
HOECHST CO AMERICAN39 citations93
US4308340ADec 29, 1981
Aqueous 2-propoxyethanol containing processing composition for lithographic printing plates
HOECHST CO AMERICAN30 citations93
US4665124AMay 12, 1987
Resin
HOECHST CO AMERICAN34 citations92
US4652604AMar 24, 1987
Radiation-polymerizable composition and element containing a photopolymer composition
HOECHST CO AMERICAN25 citations92
US4452674AJun 5, 1984
Electrolytes for electrochemically treated metal plates
HOECHST CO AMERICAN43 citations92
US4448647AMay 15, 1984
Electrochemically treated metal plates
HOECHST CO AMERICAN44 citations92
US4399021AAug 16, 1983
Novel electrolytes for electrochemically treated metal plates
HOECHST CO AMERICAN40 citations92
US4772538ASep 20, 1988
Water developable lithographic composition
HOECHST CO AMERICAN40 citations90
US4435496AMar 6, 1984
Photopolymer cleavage imaging system
HOECHST CO AMERICAN42 citations90
US4436804AMar 13, 1984
Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith
HOECHST CO AMERICAN21 citations82
US4388156AJun 14, 1983
Aluminum electrolysis in non-aqueous monomeric organic acid
HOECHST CO AMERICAN21 citations82
US4376814AMar 15, 1983
Ceramic deposition on aluminum
HOECHST CO AMERICAN20 citations82
US4374710AFeb 22, 1983
Electrolytic graining of aluminum with nitric and oxalic acids
HOECHST CO AMERICAN19 citations82
US4355096AOct 19, 1982
Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof
HOECHST CO AMERICAN20 citations82
US4336113AJun 22, 1982
Electrolytic graining of aluminum with hydrogen peroxide and nitric or hydrochloric acid
HOECHST CO AMERICAN27 citations79
US4670507AJun 2, 1987
Resin
HOECHST CO AMERICAN16 citations74
US4448873AMay 15, 1984
Negative working diazo contact film
HOECHST CO AMERICAN9 citations74
US4436807AMar 13, 1984
Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
HOECHST CO AMERICAN14 citations74
US4396468AAug 2, 1983
Three phase graining of aluminum substrates
HOECHST CO AMERICAN11 citations74
US4381340AApr 26, 1983
Method of treating lithographic printing plates with 2-propoxyethanol
HOECHST CO AMERICAN16 citations74
US4351895ASep 28, 1982
Deletion fluid for positive printing plates
HOECHST CO AMERICAN16 citations74
US4618562AOct 21, 1986
Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor
HOECHST CO AMERICAN10 citations73
US4213887AJul 22, 1980
Lithographic plate finisher
HOECHST CO AMERICAN11 citations73
US4533620AAug 6, 1985
Light sensitive co-condensates
HOECHST CO AMERICAN16 citations72
US4414311ANov 8, 1983
Cathodic deposition of light sensitive components
HOECHST CO AMERICAN9 citations72
US4539285ASep 3, 1985
Photosensitive negative diazo composition with two acrylic polymers for photolithography
HOECHST CO AMERICAN9 citations71
US4416972ANov 22, 1983
Electrolytic graining of aluminum with nitric and boric acids
HOECHST CO AMERICAN17 citations70
US4381226AApr 26, 1983
Electrochemical treatment of aluminum in non-aqueous polymeric polybasic organic acid containing electrolytes
HOECHST CO AMERICAN3 citations62
EASTMAN KODAK CO
12 patentsUS5169897ADec 8, 1992
Binary acetal polymers useful in photosensitive compositions and lithographic printing plates
EASTMAN KODAK CO84 citations96
US5368974ANov 29, 1994
Lithographic printing plates having a hydrophilic barrier layer comprised of a copolymer of vinylphosphonic acid and acrylamide overlying an aluminum support
EASTMAN KODAK CO46 citations93
US5275907AJan 4, 1994
Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding
EASTMAN KODAK CO25 citations93
US5262270ANov 16, 1993
Photosensitive compositions and lithographic printing plates containing binary acetal polymers
EASTMAN KODAK CO38 citations93
US5061607AOct 29, 1991
Composition for protecting the surface of lithographic printing plates
EASTMAN KODAK CO26 citations93
US5035982AJul 30, 1991
Aqueous developer composition for developing negative working lithographic printing plate
EASTMAN KODAK CO33 citations93
US5316892AMay 31, 1994
Method for developing lithographic printing plates
EASTMAN KODAK CO33 citations92
US5219699AJun 15, 1993
Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymers
EASTMAN KODAK CO22 citations89
US5169898ADec 8, 1992
Acid-substituted ternary acetal polymers useful in photosensitive compositions and lithographic printing plates
EASTMAN KODAK CO31 citations89
US5466559ANov 14, 1995
Aqueous developer for lithographic printing plates which exhibits reduced sludge formation
EASTMAN KODAK CO19 citations81
US5279927AJan 18, 1994
Aqueous developer for lithographic printing plates with improved desensitizing capability
EASTMAN KODAK CO16 citations73
US5342435AAug 30, 1994
Scratch remover and desensitizer composition for use with lithographic printing plates
EASTMAN KODAK CO6 citations63
HOECHST CELANESE CORP
6 patentsUS4880555ANov 14, 1989
Enzyme hydrolyzed maltodextrin containing finisher/preserver/cleaner composition for lithographic printing plates
HOECHST CELANESE CORP20 citations74
US4927737AMay 22, 1990
Radiation polymerizable composition and element containing a photopolymerizable acrylic monomer
HOECHST CELANESE CORP7 citations73
US4707437ANov 17, 1987
Radiation-polymerizable composition and element containing a photopolymer composition
HOECHST CELANESE CORP8 citations73
US4895788AJan 23, 1990
Water developable lithographic composition
HOECHST CELANESE CORP12 citations71
US4780392AOct 25, 1988
Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
HOECHST CELANESE CORP6 citations62
US4946373AAug 7, 1990
Radiation-polymerizable composition
HOECHST CELANESE CORP6 citations61
KODAK POLCYHROME GRAPHICS LLC
1 patentKODAK POLYCHROME GRAPHICS LLC
1 patentS O LITHO CORP
1 patentShowing the top 50 of 59 patents by PatentIndex Score.