Inventor
HAO MING YIN
US25 patents
⚠️ This page may combine multiple inventors who share the name “HAO MING YIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
22 patentsUS6444550B1Sep 3, 2002
Laser tailoring retrograde channel profile in surfaces
ADVANCED MICRO DEVICES INC135 citations98
US6506640B1Jan 14, 2003
Multiple channel implantation to form retrograde channel profile and to engineer threshold voltage and sub-surface punch-through
ADVANCED MICRO DEVICES INC129 citations97
US6194259B1Feb 27, 2001
Forming retrograde channel profile and shallow LLDD/S-D extensions using nitrogen implants
ADVANCED MICRO DEVICES INC135 citations97
US5939763AAug 17, 1999
Ultrathin oxynitride structure and process for VLSI applications
ADVANCED MICRO DEVICES INC263 citations97
US6245689B1Jun 12, 2001
Process for reliable ultrathin oxynitride formation
ADVANCED MICRO DEVICES INC107 citations96
US6187687B1Feb 13, 2001
Minimization of line width variation in photolithography
ADVANCED MICRO DEVICES INC23 citations93
US6475868B1Nov 5, 2002
Oxygen implantation for reduction of junction capacitance in MOS transistors
ADVANCED MICRO DEVICES INC29 citations92
US6372590B1Apr 16, 2002
Method for making transistor having reduced series resistance
ADVANCED MICRO DEVICES INC23 citations92
US6306702B1Oct 23, 2001
Dual spacer method of forming CMOS transistors with substantially the same sub 0.25 micron gate length
ADVANCED MICRO DEVICES INC29 citations92
US6472283B1Oct 29, 2002
MOS transistor processing utilizing UV-nitride removable spacer and HF etch
ADVANCED MICRO DEVICES INC51 citations91
US6344396B1Feb 5, 2002
Removable spacer technology using ion implantation for forming asymmetric MOS transistors
ADVANCED MICRO DEVICES INC51 citations91
US6342423B1Jan 29, 2002
MOS-type transistor processing utilizing UV-nitride removable spacer and HF etch
ADVANCED MICRO DEVICES INC16 citations84
US6316322B1Nov 13, 2001
Method for fabricating semiconductor device
ADVANCED MICRO DEVICES INC17 citations84
US5817536AOct 6, 1998
Method to optimize p-channel CMOS ICs using Qbd as a monitor of boron penetration
ADVANCED MICRO DEVICES INC17 citations84
US6423601B1Jul 23, 2002
Retrograde well structure formation by nitrogen implantation
ADVANCED MICRO DEVICES INC9 citations74
US6410393B1Jun 25, 2002
Semiconductor device with asymmetric channel dopant profile
ADVANCED MICRO DEVICES INC13 citations74
US6372582B1Apr 16, 2002
Indium retrograde channel doping for improved gate oxide reliability
ADVANCED MICRO DEVICES INC13 citations74
US6051460AApr 18, 2000
Preventing boron penetration through thin gate oxide of P-channel devices by doping polygate with silicon
ADVANCED MICRO DEVICES INC9 citations73
US5973370AOct 26, 1999
Preventing boron penetration through thin gate oxide of P-channel devices in advanced CMOS technology
ADVANCED MICRO DEVICES INC10 citations73
US5786254AJul 28, 1998
Hot-carrier reliability in submicron MOS devices by oxynitridation
ADVANCED MICRO DEVICES INC16 citations73
US5757204AMay 26, 1998
Method and circuit for detecting boron ("B") in a semiconductor device using threshold voltage ("V") fluence test
ADVANCED MICRO DEVICES INC11 citations73
US6274915B1Aug 14, 2001
Method of improving MOS device performance by controlling degree of depletion in the gate electrode
ADVANCED MICRO DEVICES INC6 citations62
UNITED MICROELECTRONICS CORP
3 patentsUS6894364B2May 17, 2005
Capacitor in an interconnect system and method of manufacturing thereof
UNITED MICROELECTRONICS CORP13 citations81
US6316303B1Nov 13, 2001
Method of fabricating a MOS transistor having SEG silicon
UNITED MICROELECTRONICS CORP13 citations74
US6297112B1Oct 2, 2001
Method of forming a MOS transistor
UNITED MICROELECTRONICS CORP14 citations74