P

Inventor

HAO MING YIN

US25 patents
⚠️ This page may combine multiple inventors who share the name “HAO MING YIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

22 patents
US6444550B1Sep 3, 2002

Laser tailoring retrograde channel profile in surfaces

ADVANCED MICRO DEVICES INC135 citations98
US6506640B1Jan 14, 2003

Multiple channel implantation to form retrograde channel profile and to engineer threshold voltage and sub-surface punch-through

ADVANCED MICRO DEVICES INC129 citations97
US6194259B1Feb 27, 2001

Forming retrograde channel profile and shallow LLDD/S-D extensions using nitrogen implants

ADVANCED MICRO DEVICES INC135 citations97
US5939763AAug 17, 1999

Ultrathin oxynitride structure and process for VLSI applications

ADVANCED MICRO DEVICES INC263 citations97
US6245689B1Jun 12, 2001

Process for reliable ultrathin oxynitride formation

ADVANCED MICRO DEVICES INC107 citations96
US6187687B1Feb 13, 2001

Minimization of line width variation in photolithography

ADVANCED MICRO DEVICES INC23 citations93
US6475868B1Nov 5, 2002

Oxygen implantation for reduction of junction capacitance in MOS transistors

ADVANCED MICRO DEVICES INC29 citations92
US6372590B1Apr 16, 2002

Method for making transistor having reduced series resistance

ADVANCED MICRO DEVICES INC23 citations92
US6306702B1Oct 23, 2001

Dual spacer method of forming CMOS transistors with substantially the same sub 0.25 micron gate length

ADVANCED MICRO DEVICES INC29 citations92
US6472283B1Oct 29, 2002

MOS transistor processing utilizing UV-nitride removable spacer and HF etch

ADVANCED MICRO DEVICES INC51 citations91
US6344396B1Feb 5, 2002

Removable spacer technology using ion implantation for forming asymmetric MOS transistors

ADVANCED MICRO DEVICES INC51 citations91
US6342423B1Jan 29, 2002

MOS-type transistor processing utilizing UV-nitride removable spacer and HF etch

ADVANCED MICRO DEVICES INC16 citations84
US6316322B1Nov 13, 2001

Method for fabricating semiconductor device

ADVANCED MICRO DEVICES INC17 citations84
US5817536AOct 6, 1998

Method to optimize p-channel CMOS ICs using Qbd as a monitor of boron penetration

ADVANCED MICRO DEVICES INC17 citations84
US6423601B1Jul 23, 2002

Retrograde well structure formation by nitrogen implantation

ADVANCED MICRO DEVICES INC9 citations74
US6410393B1Jun 25, 2002

Semiconductor device with asymmetric channel dopant profile

ADVANCED MICRO DEVICES INC13 citations74
US6372582B1Apr 16, 2002

Indium retrograde channel doping for improved gate oxide reliability

ADVANCED MICRO DEVICES INC13 citations74
US6051460AApr 18, 2000

Preventing boron penetration through thin gate oxide of P-channel devices by doping polygate with silicon

ADVANCED MICRO DEVICES INC9 citations73
US5973370AOct 26, 1999

Preventing boron penetration through thin gate oxide of P-channel devices in advanced CMOS technology

ADVANCED MICRO DEVICES INC10 citations73
US5786254AJul 28, 1998

Hot-carrier reliability in submicron MOS devices by oxynitridation

ADVANCED MICRO DEVICES INC16 citations73
US5757204AMay 26, 1998

Method and circuit for detecting boron ("B") in a semiconductor device using threshold voltage ("V") fluence test

ADVANCED MICRO DEVICES INC11 citations73
US6274915B1Aug 14, 2001

Method of improving MOS device performance by controlling degree of depletion in the gate electrode

ADVANCED MICRO DEVICES INC6 citations62

UNITED MICROELECTRONICS CORP

3 patents