Inventor
KANNO SEIICHIRO
JP43 patents
⚠️ This page may combine multiple inventors who share the name “KANNO SEIICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
25 patentsUS6646233B2Nov 11, 2003
Wafer stage for wafer processing apparatus and wafer processing method
HITACHI HIGH TECH CORP89 citations98
US7138606B2Nov 21, 2006
Wafer processing method
HITACHI HIGH TECH CORP53 citations96
US6895179B2May 17, 2005
Wafer stage for wafer processing apparatus
HITACHI HIGH TECH CORP37 citations92
US6825617B2Nov 30, 2004
Semiconductor processing apparatus
HITACHI HIGH TECH CORP37 citations92
US6677167B2Jan 13, 2004
Wafer processing apparatus and a wafer stage and a wafer processing method
HITACHI HIGH TECH CORP39 citations92
US7931776B2Apr 26, 2011
Plasma processing apparatus
HITACHI HIGH TECH CORP8 citations84
US7396771B2Jul 8, 2008
Plasma etching apparatus and plasma etching method
HITACHI HIGH TECH CORP15 citations84
US10872742B2Dec 22, 2020
Charged particle beam device
HITACHI HIGH TECH CORP8 citations83
US7771564B2Aug 10, 2010
Plasma processing apparatus
HITACHI HIGH TECH CORP10 citations83
US10790111B2Sep 29, 2020
Charged-particle beam device
HITACHI HIGH TECH CORP2 citations72
US9543113B2Jan 10, 2017
Charged-particle beam device for irradiating a charged particle beam on a sample
HITACHI HIGH TECH CORP2 citations72
US9601307B2Mar 21, 2017
Charged particle radiation apparatus
HITACHI HIGH TECH CORP4 citations71
US9401297B2Jul 26, 2016
Electrostatic chuck mechanism and charged particle beam apparatus
HITACHI HIGH TECH CORP5 citations70
US7567422B2Jul 28, 2009
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP6 citations63
US7183715B2Feb 27, 2007
Method for operating a semiconductor processing apparatus
HITACHI HIGH TECH CORP2 citations63
US11735394B2Aug 22, 2023
Charged particle beam apparatus
HITACHI HIGH TECH CORP1 citations62
US10903036B2Jan 26, 2021
Charged-particle beam device
HITACHI HIGH TECH CORP0 citations62
US7838792B2Nov 23, 2010
Plasma processing apparatus capable of adjusting temperature of sample stand
HITACHI HIGH TECH CORP4 citations62
US9105446B2Aug 11, 2015
Charged particle beam apparatus
HITACHI HIGH TECH CORP2 citations61
US12211665B2Jan 28, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations60
US12106930B2Oct 1, 2024
Charged particle beam device
HITACHI HIGH TECH CORP1 citations60
US11929231B2Mar 12, 2024
Charged particle beam device
HITACHI HIGH TECH CORP0 citations60
US11335533B2May 17, 2022
Charged particle beam device
HITACHI HIGH TECH CORP0 citations60
US9666408B2May 30, 2017
Apparatus and method for processing sample, and charged particle radiation apparatus
HITACHI HIGH TECH CORP1 citations52
US9799486B2Oct 24, 2017
Charged particle beam apparatus for measuring surface potential of a sample
HITACHI HIGH TECH CORP0 citations41
HITACHI LTD
11 patentsUS6590179B2Jul 8, 2003
Plasma processing apparatus and method
HITACHI LTD66 citations96
US6373681B2Apr 16, 2002
Electrostatic chuck, and method of and apparatus for processing sample using the chuck
HITACHI LTD67 citations96
US6243251B1Jun 5, 2001
Electrostatic chuck, and method of and apparatus for processing sample using the chuck
HITACHI LTD50 citations96
US5946184AAug 31, 1999
Electrostatic chuck, and method of and apparatus for processing sample
HITACHI LTD87 citations96
US6716301B2Apr 6, 2004
Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe
HITACHI LTD25 citations92
US6549393B2Apr 15, 2003
Semiconductor wafer processing apparatus and method
HITACHI LTD19 citations92
US5781400AJul 14, 1998
Electrostatically attracting electrode and a method of manufacture thereof
HITACHI LTD34 citations92
US6583979B1Jun 24, 2003
Electrostatically attracting electrode and a method of manufacture thereof
HITACHI LTD25 citations91
US6771481B2Aug 3, 2004
Plasma processing apparatus for processing semiconductor wafer using plasma
HITACHI LTD19 citations84
US6370007B2Apr 9, 2002
Electrostatic chuck
HITACHI LTD17 citations83
US6747239B2Jun 8, 2004
Plasma processing apparatus and method
HITACHI LTD8 citations74