Inventor

DEBOER SCOTT JEFFREY

US45 patents

⚠️ This page may combine multiple inventors who share the name “DEBOER SCOTT JEFFREY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DEBOER SCOTT JEFFREY

MICRON TECHNOLOGY INC

Methods of forming carbon-containing layers

Semiconductor circuit components and capacitors

Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride

Capacitor having tantalum oxynitride film and method for making same

Capacitors, methods of forming capacitors, and DRAM memory cells

Method of forming capacitors having high-K oxygen containing capacitor dielectric layers, method of processing high-K oxygen containing dielectric layers, method of forming a DRAM cell having having high-K oxygen containing capacitor dielectric layers

Method of forming capacitors containing tantalum

Capacitor having tantalum oxynitride film and method for making same

High pressure reoxidation/anneal of high dielectric constant

Methods of forming gated semiconductor assemblies

Buried bit line memory circuitry

High pressure reoxidation/anneal of high dielectric constant materials

Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride

Methods of forming buried bit line memory circuitry

Semiconductor circuit components and capacitors

Method of processing internal surfaces of a chemical vapor deposition reactor

Capacitor with conductively doped Si-Ge alloy electrode

Antifuse having tantalum oxynitride film and method for making same

Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride

Capacitor having tantalum oxynitride film and method for making same

Selective spacer to prevent metal oxide formation during polycide reoxidation

Methods of forming capacitors

Gated semiconductor assemblies

Semiconductor wafer assemblies comprising photoresist over silicon nitride materials

Method of forming capacitors containing tantalum

Method of processing internal surfaces of a chemical vapor deposition reactor

Semiconductor wafer assemblies comprising photoresist over silicon nitride materials

Methods of forming capacitors

Semiconductor processing method of forming a conductive line, and buried bit line memory circuitry

Semiconductor processing methods of forming photoresist over silicon nitride materials

Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride

Method to prevent metal oxide formation during polycide reoxidation

Semiconductor wafer assemblies comprising photoresist over silicon nitride materials

Methods of forming a layer of silicon nitride in semiconductor fabrication processes

Methods of forming a layer of silicon nitride in a semiconductor fabrication process

Semiconductor processing methods utilizing boron and nitrogen, and semiconductor wafers comprising boron and nitrogen

Method of forming silicon nitride layer directly on HSG polysilicon

Semiconductor processing methods of transferring patterns from patterned photoresists to materials

Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride

Structures comprising a layer free of nitrogen between silicon nitride and photoresist

Gated semiconductor assemblies and methods of forming gated semiconductor assemblies

Capacitor constructions, DRAM constructions, and semiconductive material assemblies

Semiconductive wafer assemblies

Methods of forming a layer of silicon nitride in a semiconductor fabrication process

(unassigned)

High pressure reoxidation/anneal of high dielectric constant materials