Inventor · disambiguated record
Taeko Ikegawa
Also filed as: IKEGAWA TAEKO
2 granted patents·2 pending applications·25 citations·filing 2001–2003
56Inventor score
Files withTOKYO OHKA KOGYO CO LTD4
Top patents by PatentIndex Score
4 records- 0184US6517993B2Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Feb 11, 2003·25 cites·16 claims
- 0238US2002031720A1Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2001·Application pending·0 cites
- 0332US6884566B2Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Apr 26, 2005·0 cites·9 claims
- 0430US2003186171A1Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
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