Inventor
MADER LEONHARD
DE2 patents
Patents
2 patentsUS5397664AMar 14, 1995
Phase mask for projection lithography and method for the manufacture thereof
SIEMENS AG18 citations78
US5284724AFeb 8, 1994
Phase mask for projection lithography and method for the manufacture thereof comprising a selectively etchable phase shift layer directly on substrate
SIEMENS AG9 citations70