Inventor
MITSUI HIDEAKI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “MITSUI HIDEAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
21 patentsUS6335124B1Jan 1, 2002
Phase shift mask and phase shift mask blank
HOYA CORP72 citations96
US6087047AJul 11, 2000
Phase shift mask and phase shift mask blank
HOYA CORP36 citations92
US5955223ASep 21, 1999
Phase-shift mask blank and process for the production thereof comprising a semi transparent film with silicon and nitrogen
HOYA CORP22 citations92
US7011910B2Mar 14, 2006
Halftone-type phase-shift mask blank, and halftone-type phase-shift mask
HOYA CORP13 citations84
US7115341B2Oct 3, 2006
Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same
HOYA CORP14 citations83
US6783634B2Aug 31, 2004
Manufacturing method and apparatus of phase shift mask blank
HOYA CORP12 citations82
US7060394B2Jun 13, 2006
Halftone phase-shift mask blank and halftone phase-shift mask
HOYA CORP8 citations74
US6723477B2Apr 20, 2004
Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask
HOYA CORP6 citations74
US6677087B2Jan 13, 2004
Phase shift mask blank, phase shift mask, and method for manufacturing the same
HOYA CORP10 citations74
US6395434B1May 28, 2002
Phase shift mask and phase shift mask blank
HOYA CORP8 citations73
US6844119B2Jan 18, 2005
Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask
HOYA CORP9 citations72
US6762000B2Jul 13, 2004
Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks
HOYA CORP10 citations70
US8048594B2Nov 1, 2011
Photomask blank, photomask, and methods of manufacturing the same
HOYA CORP2 citations63
US7402228B2Jul 22, 2008
Manufacturing method and apparatus of phase shift mask blank
HOYA CORP1 citations63
US7282121B2Oct 16, 2007
Manufacturing method and apparatus of phase shift mask blank
HOYA CORP2 citations63
US7862963B2Jan 4, 2011
Halftone type phase shift mask blank and phase shift mask thereof
HOYA CORP3 citations61
US7592106B2Sep 22, 2009
Halftone type phase shift mask blank and phase shift mask thereof
HOYA CORP4 citations61
US7169513B2Jan 30, 2007
Halftone type phase shift mask blank and phase shift mask thereof
HOYA CORP3 citations61
US8012314B2Sep 6, 2011
Manufacturing method and apparatus of phase shift mask blank
HOYA CORP0 citations52
US7632612B2Dec 15, 2009
Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same
HOYA CORP1 citations51
US8021806B2Sep 20, 2011
Photomask blank, photomask, and methods of manufacturing the same
HOYA CORP0 citations42