Inventor
GLUSCHENKOV OLEG G
US28 patents
⚠️ This page may combine multiple inventors who share the name “GLUSCHENKOV OLEG G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
24 patentsUS7247534B2Jul 24, 2007
Silicon device on Si:C-OI and SGOI and method of manufacture
IBM95 citations99
US7198995B2Apr 3, 2007
Strained finFETs and method of manufacture
IBM154 citations99
US7015082B2Mar 21, 2006
High mobility CMOS circuits
IBM159 citations99
US6891192B2May 10, 2005
Structure and method of making strained semiconductor CMOS transistors having lattice-mismatched semiconductor regions underlying source and drain regions
IBM179 citations99
US7279413B2Oct 9, 2007
High-temperature stable gate structure with metallic electrode
IBM53 citations96
US7223994B2May 29, 2007
Strained Si on multiple materials for bulk or SOI substrates
IBM21 citations93
US7291528B2Nov 6, 2007
Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions
IBM16 citations92
US7144767B2Dec 5, 2006
NFETs using gate induced stress modulation
IBM24 citations92
US6989322B2Jan 24, 2006
Method of forming ultra-thin silicidation-stop extensions in mosfet devices
IBM27 citations92
US7683418B2Mar 23, 2010
High-temperature stable gate structure with metallic electrode
IBM10 citations84
US7396714B2Jul 8, 2008
Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions
IBM11 citations84
US7170126B2Jan 30, 2007
Structure of vertical strained silicon devices
IBM16 citations84
US6974991B2Dec 13, 2005
DRAM cell with buried collar and self-aligned buried strap
IBM12 citations81
US7402870B2Jul 22, 2008
Ultra shallow junction formation by epitaxial interface limited diffusion
IBM5 citations74
US7119403B2Oct 10, 2006
High performance strained CMOS devices
IBM7 citations74
US7521345B2Apr 21, 2009
High-temperature stable gate structure with metallic electrode
IBM5 citations73
US7847358B2Dec 7, 2010
High performance strained CMOS devices
IBM3 citations63
US7560328B2Jul 14, 2009
Strained Si on multiple materials for bulk or SOI substrates
IBM4 citations63
US7285826B2Oct 23, 2007
High mobility CMOS circuits
IBM4 citations63
US7205207B2Apr 17, 2007
High performance strained CMOS devices
IBM2 citations63
US8013392B2Sep 6, 2011
High mobility CMOS circuits
IBM1 citations52
US7816237B2Oct 19, 2010
Ultra shallow junction formation by epitaxial interface limited diffusion
IBM0 citations52
US7569848B2Aug 4, 2009
Mobility enhanced CMOS devices
IBM1 citations52
US7232774B2Jun 19, 2007
Polycrystalline silicon layer with nano-grain structure and method of manufacture
IBM0 citations50