Inventor

VAN DEN BROEKE DOUGLAS

US29 patents

⚠️ This page may combine multiple inventors who share the name “VAN DEN BROEKE DOUGLAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VAN DEN BROEKE DOUGLAS

ASML MASKTOOLS BV

Method, program product and apparatus for performing double exposure lithography

Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography

Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography

Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM

Method and apparatus for performing dark field double dipole lithography (DDL)

Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM

Method, program product and apparatus for generating assist features utilizing an image field map

Scattering bar OPC application method for sub-half wavelength lithography patterning

Method for performing transmission tuning of a mask pattern to improve process latitude

Method and apparatus for performing dark field double dipole lithography (DDL)

Scattering bar OPC application method for sub-half wavelength lithography patterning

Scattering bar OPC application method for sub-half wavelength lithography patterning

Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique

Method for performing pattern pitch-split decomposition utilizing anchoring features

Optical proximity correction method utilizing phase-edges as sub-resolution assist features

Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration

Scattering bar OPC application method for sub-half wavelength lithography patterning

Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology

Method for improved manufacturability and patterning of sub-wavelength contact hole mask

CPL mask and a method and program product for generating the same

CPL mask and a method and program product for generating the same

HSU DUAN-FU STEPHEN

Method and apparatus for performing model-based OPC for pattern decomposed features

Method and apparatus for performing model-based OPC for pattern decomposed features

Method and apparatus for performing dark field double dipole lithography (DDL)

CHEN JANG FUNG

Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process

Method, program product and apparatus for performing double exposure lithography

Method, program product and apparatus for performing double exposure lithography

ASML MASKTOOKS B V

Eigen decomposition based OPC model

VAN DEN BROEKE DOUGLAS

Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography