Inventor

OKUI TOSHIKI

JP13 patents

⚠️ This page may combine multiple inventors who share the name “OKUI TOSHIKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

10 patents

US6838229B2Jan 4, 2005

Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same

TOKYO OHKA KOGYO CO LTD22 citations92

US6641972B2Nov 4, 2003

Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same

TOKYO OHKA KOGYO CO LTD21 citations91

US7132213B2Nov 7, 2006

Positive photoresist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD9 citations73

US5908734AJun 1, 1999

Image formation method with a post exposure heating step

TOKYO OHKA KOGYO CO LTD7 citations73

US7169532B2Jan 30, 2007

Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal

TOKYO OHKA KOGYO CO LTD6 citations62

US7081327B2Jul 25, 2006

Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal

TOKYO OHKA KOGYO CO LTD3 citations62

US7419769B2Sep 2, 2008

Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same

TOKYO OHKA KOGYO CO LTD4 citations61

US7951522B2May 31, 2011

Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal

TOKYO OHKA KOGYO CO LTD0 citations41

US7927778B2Apr 19, 2011

Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal

TOKYO OHKA KOGYO CO LTD0 citations41

US7462436B2Dec 9, 2008

Positive photoresist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations41

TOYKO OHKA KOGYO CO LTD

2 patents

US7063934B2Jun 20, 2006

Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same

TOYKO OHKA KOGYO CO LTD15 citations90

US7129018B2Oct 31, 2006

Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same

TOYKO OHKA KOGYO CO LTD2 citations60

MISUMI KOICHI

1 patent

US9436084B2Sep 6, 2016

Positive-working photoresist composition for thick film formation

MISUMI KOICHI1 citations50