Inventor
KOMANO HIROSHI
JP42 patents
⚠️ This page may combine multiple inventors who share the name “KOMANO HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
38 patentsUS6063953AMay 16, 2000
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD90 citations98
US5714625AFeb 3, 1998
Cyanooxime sulfonate compound
TOKYO OHKA KOGYO CO LTD143 citations98
US6010824AJan 4, 2000
Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same
TOKYO OHKA KOGYO CO LTD109 citations97
US6261745B1Jul 17, 2001
Post-ashing treating liquid compositions and a process for treatment therewith
TOKYO OHKA KOGYO CO LTD71 citations96
US6388101B1May 14, 2002
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD42 citations93
US6268108B1Jul 31, 2001
Composition for forming antireflective coating film and method for forming resist pattern using same
TOKYO OHKA KOGYO CO LTD40 citations93
US6136505AOct 24, 2000
Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film
TOKYO OHKA KOGYO CO LTD21 citations93
US6087063AJul 11, 2000
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD37 citations93
US5929271AJul 27, 1999
Compounds for use in a positive-working resist composition
TOKYO OHKA KOGYO CO LTD26 citations93
US5885746AMar 23, 1999
Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate
TOKYO OHKA KOGYO CO LTD22 citations93
US6838229B2Jan 4, 2005
Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same
TOKYO OHKA KOGYO CO LTD22 citations92
US6376153B2Apr 23, 2002
Photopolymerizable composition for color filter
TOKYO OHKA KOGYO CO LTD32 citations92
US6022666AFeb 8, 2000
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD21 citations92
US5908720AJun 1, 1999
Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof
TOKYO OHKA KOGYO CO LTD23 citations92
US5902713AMay 11, 1999
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD23 citations92
US5800964ASep 1, 1998
Photoresist composition
TOKYO OHKA KOGYO CO LTD20 citations92
US5714286AFeb 3, 1998
Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof
TOKYO OHKA KOGYO CO LTD42 citations92
US5498498AMar 12, 1996
Photosensitive resin composition used in a method for forming a light-shielding film
TOKYO OHKA KOGYO CO LTD19 citations92
US5368991ANov 29, 1994
Photosensitive resin composition for use as a light-shielding film which can be used as black matrices
TOKYO OHKA KOGYO CO LTD40 citations92
US6641972B2Nov 4, 2003
Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same
TOKYO OHKA KOGYO CO LTD21 citations91
US5578420ANov 26, 1996
Process for producing a flexographic printing plate
TOKYO OHKA KOGYO CO LTD18 citations82
US5543268AAug 6, 1996
Developer solution for actinic ray-sensitive resist
TOKYO OHKA KOGYO CO LTD17 citations82
US6683202B2Jan 27, 2004
Fluorine-containing monomeric ester compound for base resin in photoresist composition
TOKYO OHKA KOGYO CO LTD8 citations74
US6329126B1Dec 11, 2001
Developer solution for acitinic ray sensitive resist
TOKYO OHKA KOGYO CO LTD12 citations74
US6225476B1May 1, 2001
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD6 citations74
US6171749B1Jan 9, 2001
Negative-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD12 citations74
US6077644AJun 20, 2000
Positive-working resist composition
TOKYO OHKA KOGYO CO LTD7 citations74
US5928837AJul 27, 1999
Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds
TOKYO OHKA KOGYO CO LTD14 citations74
US5892095AApr 6, 1999
Cyano group-containing oxime sulfonate compounds
TOKYO OHKA KOGYO CO LTD8 citations74
US4847178AJul 11, 1989
Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester
TOKYO OHKA KOGYO CO LTD14 citations74
US6787284B2Sep 7, 2004
Positive resist composition and base material carrying layer of the positive resist composition
TOKYO OHKA KOGYO CO LTD7 citations73
US6265116B1Jul 24, 2001
Process for producing color filter
TOKYO OHKA KOGYO CO LTD9 citations73
US5908734AJun 1, 1999
Image formation method with a post exposure heating step
TOKYO OHKA KOGYO CO LTD7 citations73
US5521054AMay 28, 1996
Developing solution comprising an aromatic hydrocarbon, an alcohol, and an ester
TOKYO OHKA KOGYO CO LTD10 citations73
US5990338ANov 23, 1999
Negative-working chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD1 citations63
US5973187AOct 26, 1999
Positive-working chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD1 citations63
US7419769B2Sep 2, 2008
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same
TOKYO OHKA KOGYO CO LTD4 citations61
US6846949B2Jan 25, 2005
Fluorine-containing monomeric ester compound for base resin in photoresist composition
TOKYO OHKA KOGYO CO LTD0 citations52
NEC CORP
2 patentsTOYKO OHKA KOGYO CO LTD
2 patentsUS7063934B2Jun 20, 2006
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same
TOYKO OHKA KOGYO CO LTD15 citations90
US7129018B2Oct 31, 2006
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same
TOYKO OHKA KOGYO CO LTD2 citations60